Investigation of thin films MgAl2O4, deposited on the Si substrates by vacuum thermal evaporation

The article presents data on the study of X-ray structural and microstructural characteristics of thin films of aluminum-magnesium spinel MgAl2O4 deposited on Si substrates by vacuum thermal evaporation. MgAl2O4 films have a polycrystalline rhombic structure. The values of the unit cell parameters of MgAl2O4 are calculated. Scanning electron and atomic force microscopy showed that MgAl2O4 films have a densely packed structure without cracks. Physical characteristics and good adhesion of MgAl2O4 thin films to silicon substrates indicate their possibility of using in devices of opto- and microelectronics

Optical Characteristics of Antireflection Coatings Based on Al2O3-SiO2 for Silicon Solar Cells

The results from modeling, manufacture, and investigation of the integral reflection coefficient (RS) of single-layer composite antireflection coatings of Al2O3–SiO2 for silicon solar cells with integral reflection coefficient RS ≤ 10% are presented. It was shown that for Al2O3 concentrations of 52–84 wt.%, SiO2 concentrations of 16–48 wt.%, and thickness of 53–97 nm the smallest values of RS are 73–77% for Al2O3 and 27–23% for SiO2 with thickness of 69–75 nm. It was shown experimentally that for layers with Al2O3:SiO2 = 75:25 wt.% with thickness of 72 nm RS = 3.53%, which is approximately half of the RS value for Si3N4