A method for producing uniform dose distributions in the junction regions of large hinge angle electron fields

PurposeThe planning problems presented by abutting electron fields are well recognized. Junctioning electron fields with a large hinge angle compounds the problems because of the creation of closely situated high dose and low-dose regions.Methods and materialsThe technique involving a compensated superficial x-ray (SXR) field to treat the junction region between electron fields was developed and used in a particular clinical case (treatment of a squamous cell carcinoma of the forehead/scalp). The superficial x-ray beam parameters were chosen and the compensator was designed to make the SXR field complementary to the electron fields.ResultsApplication of a compensated SXR field eliminated low dose zones in the junction region and reduced high dose zones to 110%. In the clinical case discussed, the high-dose areas due to the SXR field would not appear because of increased attenuation of the soft X-rays in bone.ConclusionThe technique proposed produces uniform dose distribution up to 3 cm deep and can be considered as an additional tool for dealing with electron field junctioning problems.Sergel F. Zavgorodni, Wayne A. Beckham, Daniel E. Roo