Mutual phase locking of a coupled laser diode-Gunn diode pair

Mutual phase locking has been achieved through series connection of a semiconductor laser and a Gunn diode oscillator. Experimental results obtained demonstrate a mutual interaction between the two oscillators which results in a short term Gunn diode oscillator stability and improved spectral purity of its output. We also observe a narrowing of laser pulses and an improvement in regularity

Variable frequency picosecond optical pulse generation from laser diodes by electrical feedback

High repetition rate picosecond optical pulse generation is achieved by providing electrical feedback (with and without external gain) to a self-pulsating laser diode. The feedback improves pulsation short-term stability (<25-kHz frequency jitter) and narrows the laser pulses (14 ps)

Phase-locking characteristics of coupled ridge-waveguide InP/InGaAsP diode lasers

The phase-locking characteristics of two coupled, ridge waveguide InP/InGaAsP diode lasers emitting at 1.2 µm were investigated experimentally. The phase locking of the lasers was verified by the observation of phase-locked modes (supermodes) in the spectrally resolved near fields and distinct diffraction patterns in the far field. By independent control of the laser currents it was possible to vary continuously the mutual phase shift between the two phase-locked lasers and thus steer the far-field diffraction lobes. In addition, the separate current control could be utilized to obtain single longitudinal mode oscillation of the phase-locked lasers. Variation in one of the laser currents resulted then in tuning of the wavelength of this single mode over a range of 90 Å

Vertical field-effect transistors in III-V semiconductors

Vertical metal-semiconductor field-effect transistors in GaAs/GaAlAs and vertical metal-oxide-semiconductor field-effect transistors (MOSFET's) in InP/GaInPAs materials have been fabricated. These structures make possible short channel devices with gate lengths defined by epitaxy rather than by submicron photolithography processes. Devices with transconductances as high as 280 mS/mm in GaAs and 60 mS/mm (with 100-nm gate oxide) for the InP/GaInPAs MOSFET's were observed

Phased arrays of buried-ridge InP/InGaAsP diode lasers

Phase-locked arrays of buried-ridge InP/InGaAsP lasers, emitting at 1.3 µm, were grown by liquid phase epitaxy. The arrays consist of index-guided, buried-ridge lasers which are coupled via their evanescent optical fields. This index-guided structure makes it possible to avoid the occurrence of lower gain in the interchannel regions. As a result, the buried-ridge arrays oscillate mainly in the fundamental supermode, which yields single lobed, narrow far-field patterns. Single lobed beams less than 4° in width were obtained from buried-ridge InP/InGaAsP phased arrays up to more than twice the threshold current

Cd diffused mesa-substrate buried heterostructure InGaAsP/InP laser

A new type of buried heterostructure InGaAsP/InP lasers grown by a single-step liquid phase epitaxy on Cd diffused mesa substrate is described. These lasers exhibit excellent current and optical confinement. Threshold currents as low as 15 mA are achieved for a laser with a 2-µm-wide active region

High-speed Schottky photodiode on semi-insulating GaAs

A high-speed GaAs photodiode has been fabricated on a GaAs semi-insulating substrate. The photodiode has an active area of 8 μm × 15 μm and a bandwidth in excess of 9 GHz. This Schottky photodiodes is suitable for monolithic integration with other optoelectronic components

Short cavity InGaAsP/InP lasers with dielectric mirrors

Short cavity length (38 µm) lasers have been fabricated using a recently developed microcleavage technique. SiO2-amorphous Si multilayer coatings have been evaported on the lasers to obtain high reflectivity mirrors. The lasers have current thresholds as low as 3.8 mA with 85% reflecting front mirror and high reflectivity rear mirror and 2.9 mA with two high reflectivity mirrors. Single longitudinal mode operation is observed over a wide range of driving currents and temperatures

Vertical FET's in GaAs

Vertical FET's in GaAlAs material systems have been fabricated. The present structure makes possible extremely short (less than 1000-Å) channel devices which are beyond the reach of optical lithographic processes. Devices with transconductance g_m high as 280 mS/mm have been obtained