51 research outputs found

    Low temperature tool for photoluminescence mapping with submicron resolution

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    Comparison of radiative and structural properties of 1.3 mu m In/sub x/Ga/sub (1-x)/As quantum-dot laser structures grown by metalorganic chemical vapor deposition and molecular-beam epitaxy: effect on the lasing properties

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    Comparison of radiative and structural properties of 1.3 ÎĽm InxGa(1-x)As quantum dot laser structure was discussed. There structures are grown by metalorganic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). Results showed that ground state is present only in MBE samples

    White light from blue: white emitting organic LEDs based on spin coated blends of blue-emitting molecules

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    White light emission can be obtained from spin-coated blends of two different blue-emitting organic molecules, due to the combination of exciplex formation and residual blue emission. Light-emitting diodes using a blend of 90% N,N′-bis(3-methylphenyl)-N,N′-diphenylbenzidine and 10% 2,5-bis(trimethylsilyl thiophene)-1,1-dioxide emits white light with Commision Internationale l'Eclairage co-ordinates of x=0.34,y=0.38, close to the equal energy point. We show that exciplex formation does not occur in all relative concentrations of the two components, and we relate this to phase separation in spin coated films, as measured using atomic force microscopy. We suggest that a limit to exciplex formation may be structural, i.e. where the structure and/or morphology of the solid state blend does not allow significant spacial overlap between the HOMO/LUMO of the two components

    Holographic Nanopatterning of the organic Semiconductor Poly(p-Phenylene Vinylene)

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    We report a flexible method for the patterning of organic semiconductors in the submicrometer range, which we have successfully applied to thin films of poly~p-phenylene vinylene! ~PPV! prepared on a variety of substrates, such as quartz, indium–tin oxide coated glass, or inorganic dielectric mirrors. The method is based on holographic lithography performed by a corner cube interferometer of our own design and construction, followed by Ar-ion etching
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