Domain wall dynamics in stepped magnetic nanowire with perpendicular magnetic anisotropy

Micromagnetic simulation is carried out to investigate the current-driven domain wall (DW) in a nanowire with perpendicular magnetic anisotropy (PMA). A stepped nanowire is proposed to pin DW and achieve high information storage capacity based on multi-bit per cell scheme. The DW speed is found to increase for thicker and narrower nanowires. For depinning DW from the stepped region, the current density Jdep is investigated with emphasis on device geometry and materials intrinsic properties. The Jdep could be analytically determined as a function of the nanocontriction dimension and the thickness of the nanowire. Furthermore, Jdep is found to exponential dependent on the anisotropy energy and saturation magnetization, offering thus more flexibility in adjusting the writing current for memory applications

Dynamics of interacting skyrmions in magnetic nano-track

Controlling multiple skyrmions in nanowires is important for their implementation in racetrack memory or neuromorphic computing. Here, we report on the dynamical behavior of two interacting skyrmions in confined devices with a comparison to a single skyrmion case. Although the two skyrmions shrink near the edges and follow a helical path, their behavior is different. Because the leading skyrmion is between the edge and the trailing one, its size is reduced further and collapses at a lower current density compared to the single skyrmion case. For higher current density, both skyrmions are annihilated with a core-collapse mechanism for the leading one followed by a bubble-collapse mechanism for the trailing one

Achieving High Aspect Ratio of Track Length to Width in Molds for Discrete Track Recording Media

Discrete track media (DTM) fabricated by nanoimprint lithography (NIL) is considered as a potential technology for future hard disk drives (HDD). In the fabrication of a master mold for NIL, patterning the resist tracks with a narrow distribution in the width is the first critical step. This paper reports the challenges involved in the fabrication of high aspect ratio discrete tracks on Polymethylmethacrylate (PMMA) resist by means of electron beam lithography. It was observed that fabrication parameters applied for successful patterning of discrete tracks in nanoscale length were not directly suitable for the patterning of discrete tracks in micron scale. Hence different approaches such as thick layer resist coating, introducing of post exposure baking process, and varying of exposure parameters were used in order to achieve uniform sharp discrete tracks in micron scale length on the resist. The optimal parameters were used to pattern 20 μm long tracks with 70 nm track pitch on the resist

Achieving High Aspect Ratio of Track Length to Width in Molds for Discrete Track Recording Media

Discrete track media (DTM) fabricated by nanoimprint lithography (NIL) is considered as a potential technology for future hard disk drives (HDD). In the fabrication of a master mold for NIL, patterning the resist tracks with a narrow distribution in the width is the first critical step. This paper reports the challenges involved in the fabrication of high aspect ratio discrete tracks on Polymethylmethacrylate (PMMA) resist by means of electron beam lithography. It was observed that fabrication parameters applied for successful patterning of discrete tracks in nanoscale length were not directly suitable for the patterning of discrete tracks in micron scale. Hence different approaches such as thick layer resist coating, introducing of post exposure baking process, and varying of exposure parameters were used in order to achieve uniform sharp discrete tracks in micron scale length on the resist. The optimal parameters were used to pattern 20 μm long tracks with 70 nm track pitch on the resist

Perspectives for 10 terabits/in 2 magnetic recording

10.1166/jnn.2011.2738Journal of Nanoscience and Nanotechnology1132704-270

Influence of spin polarizer on the magnetoresistance, switching property, and interlayer interactions in Co/Pd single spin valves

10.1109/TMAG.2012.2199969IEEE Transactions on Magnetics48113434-3437IEMG

Magnetic properties of antidots in conventional and spin-reoriented antiferromagnetically coupled layers

10.1063/1.3679602Journal of Applied Physics1117-JAPI

Magnetostatic interactions in antiferromagnetically coupled patterned media

10.1166/jnn.2011.2731Journal of Nanoscience and Nanotechnology1132555-255