Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures

A self-consistent 1-D model was developed to study the effect of the electron energy distribution function (EEDF) on power deposition and plasma density profiles in a planar inductively coupled plasma (ICP) in the non-local regime (pressure < 10 mTorr). The model consisted of three modules: (1) an electron energy distribution function (EEDF) module to compute the non-Maxwellian EEDF, (2) a non-local electron kinetics module to predict the non-local electron conductivity, RF current, electric field and power deposition profiles in the non-uniform plasma, and (3) a heavy species transport module to solve for the ion density and velocity profiles as well as the metastable density. Results using the non-Maxwellian EEDF model were compared with predictions using a Maxwellian EEDF, under otherwise identical conditions. The RF electric field, current, and power deposition profiles were different, especially at 1mTorr, for which the electron effective mean free path was larger than the skin depth. The plasma density predicted by the Maxwellian EEDF was up to 93% larger for the conditions examined. Thus, the non-Maxwellian EEDF must be accounted for in modeling ICPs at very low pressures.Comment: 19 pages submitted to Plasma Sources Sci. Techno

Observations of Toroidal Coupling for Low-N Alfven Modes in the Tca Tokamak

The antenna structure in the TCA tokamak is phased to excite preferentially Alfven waves with known toroidal and poloidal wave numbers. Surprisingly, the loading spectrum includes both discrete and continuum modes with poloidal wave numbers incompatible with the antenna phasing. These additional modes, which are important for our heating experiments, can be attributed to linear mode coupling induced by the toroidicity of the plasma column, when we take into account ion-cyclotron effects

Measurements on rotating ion cyclotron range of frequencies induced particle fluxes in axisymmetric mirror plasmas

This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder