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57 research outputs found

Aluminum silicide microparticles transformed from aluminum thin films by hypoeutectic interdiffusion

Author: A Majumdar
A Patyk
AI Boukai
AI Hochbaum
HJ Goldsmid
IV Savchenko
J Tang
J Yang
Jin-Seo Noh
JK Yu
JP Heremans
JS Rhyee
K Yu
KF Hsu
MA Korzhuev
MP De Cicco
MS Dresselhaus
MS Dresselhaus
OM Løvvik
R Brandt
RA Serway
RJ Jaccodine
W Fang
W Fulkerson
W Shim
W Xue
Y Okada
Publication venue: 'Springer Science and Business Media LLC'
Publication date
Field of study

Large Melting-Point Hysteresis of Ge Nanocrystals Embedded in SiO

Author: A. M. Glaeser
A. M. Minor
A. N. Goldstein
C. W. Yuan
C. Y. Liao
D. C. Chrzan
D. O. Yi
E. E. Haller
F. A. Lindemann
I. D. Sharp
J. Dages
J. W. Ager
J. W. Beeman
L. D. Landau
M. Albrecht
M. C. Ridgway
M. Takagi
N. T. Gladkich
P. Kluth
P. Pawlow
Q. Xu
R. J. Jaccodine
Publication venue: 'American Physical Society (APS)'
Publication date
Field of study

Surface instability and pattern formation by ion-induced erosion and mass redistribution

Author: A Hanisch
A Keller
A Keller
A Keller
A Oron
AA Stekolnikov
AS Rudy
B Davidovitch
B Davidovitch
B Ziberi
B Ziberi
CC Umbach
CS Madi
CS Madi
CS Madi
CS Madi
CW Chen
DP Datta
E Anzenberg
E Chason
E Snoeks
G Carter
G Carter
G Carter
GW Arnold
H Gnaser
H Hofsäss
H Hofsäss
H Hofsäss
H Hofsäss
Hans Hofsäss
J Grenzer
J Munoz-García
K Zhang
K Zhang
KV Sarathlal
M Castro
M Kardar
MA Makeev
ML Brongersma
MZ Hossain
MZ Hossain
N Kalyanasundaram
N Kalyanasundaram
NV Medhekar
O Bobes
P Gailly
P Karmakar
P Sigmund
PFA Alkemade
Q Hu
Q Wei
R Cuerno
RJ Jaccodine
RM Bradley
S Habenicht
S Park
S Vauth
S Vogel
SA Norris
SA Norris
SA Norris
SA Pahlovy
SE Orchard
SG Mayr
SJ Zinkle
T Dillen van
TK Chini
TM Mayer
W Eckstein
W Möller
WL Chan
Publication venue: 'Springer Science and Business Media LLC'
Publication date
Field of study

Study of Argon and Silicon Implantation Damage in Polycrystalline Silicon

Author: J. Huang
R. J. Jaccodine
Publication venue: 'The Electrochemical Society'
Publication date
Field of study

Diffusion of Sb in (111) Silicon during N 2 Heat‐Treatment

Author: R. J. Jaccodine
T. Kook
Publication venue: 'The Electrochemical Society'
Publication date
Field of study

Fast Growth of Thin Gate Dielectrics by Thermal Oxidation of Si in N 2 O Gas Ambient with Low Concentration of NF 3 Addition

Author: J. G. Huang
R. J. Jaccodine
Publication venue: 'The Electrochemical Society'
Publication date
Field of study

Effect of NF 3 on the Direct Thermal Nitridation of Silicon

Author: F. P. McCluskey
R. J. Jaccodine
Publication venue: 'The Electrochemical Society'
Publication date
Field of study

Fluorine‐Enhanced Oxidation of Silicon: Effects of Fluorine on Oxide Stress and Growth Kinetics

Author: D. Kouvatsos
J. G. Huang
R. J. Jaccodine
Publication venue: 'The Electrochemical Society'
Publication date
Field of study

Diffusion of Boron in Silicon During O 2 / NF 3 Oxidation

Author: R. J. Jaccodine
T. Kook
U. S. Kim
Publication venue: 'The Electrochemical Society'
Publication date
Field of study

Planar oxidation of strained silicon substrates

Author: Hebert
Kao
M-T. Lin
R. J. Jaccodine
Stoneham
Sutardja
T. J. Delph
Publication venue: 'Cambridge University Press (CUP)'
Publication date
Field of study

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