Process Modeling of Solid Source Phosphorus Diffusions Using SUPREM-III

Carborundum PH-1025 Solid Planar Diffusion Sources were used to perform a statistically designed diffusion matrix. The data taken from this matrix included junction depth, sheet resistance and transferred glass thickness. Modifications to the existing SUPREM-Ill diffusion model failed to produce good correlation between SUPREM-Ill and the experimental data

Conference of Microelectronic Research 1990

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