Method and system for rapid thermal processing

A method and system for rapid thermal processing (RTP) comprising a 2-step heating process and using at least one HID lamp is disclosed, in which a ripple-pyrometry temp. measurement of the object by a temp. measurement unit can be conducted without disturbing the rapid thermal processing of the object. Substantially, this is achieved by driving the lamp by a driving circuit with an operating scheme (e.g., an AC-block current shape) with addnl. superimposed pulses with varying specifications, where the frequency of the superimposed pulse is chosen such, that they create a variation of the emitted light flux that is much faster than the variation induced by the light flash used for the 2nd-step flash-anneal RTP. This enables the emissivity detn. of the object, while only causing a short change in the total light flux to the object. [on SciFinder (R)