Thermal conductivities of thin, sputtered optical films

The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO{sub 2}/Si{sub 3}N{sub 4}){sup n} and Al(Al{sub 2}O{sub 3}/AIN){sup n}. Sputtered films of more conventional materials like SiO{sub 2}, Al{sub 2}O{sub 3}, Ta{sub 2}O{sub 5}, Ti, and Si have also been measured. The data show that thin film thermal conductivities are typically 10 to 100 times lower than conductivities for the same materials in bulk form. Structural disorder in the amorphous or very fine-grained films appears to account for most of the conductivity difference. Conclusive evidence for a film/substrate interface contribution is presented

Recent developments in reactively sputtered optical thin films

Highlights of a multiyear effort to develop new or improved thin film optical coating materials through the use of reactive sputtering techniques are presented. Reactive sputtering is shown to be an extremely versatile technique capable of synthesizing broad classes of materials in a straightfoward manner. The exceptional utility of sputtering for preparation of hard coatings such as oxides, nitrides and novel materials based on Si and Ge is described. Some of these coating materials cannot be made by conventional evaporative techniques. Reactive sputtering is shown to allow precise control of coating composition, microstructure and the resulting optical properties. Examples of multilayer coatings such as all-dielectric and dielectric-enhanced mirrors made from reactively sputtered materials are included, and simple yet elegant fabrication techniques are introduced. The reactive sputtering technique and equipment used specifically for optical coatings are briefly described, and comparison is made with the conventional evaporative approach

Development of damage resistant sputtered oxide optical coatings for use at 248 NM

This report summarizes the results of a six-month effort to develop damage-resistant Kr*F laser mirrors by using and refining reactive sputter deposition techniques for the fabricaton of multilayer oxide optical coatings. Mirror performance goals included a reflectivity of 99% at 248 nm and a laser damage threshold of 5 J/cm/sup 2/ for 20 ns pulses. Oxide multilayer coating combinations selected for development were SiO/sub 2//Al/sub 2/O/sub 3/, SiO/sub 2//HfO/sub 2/ and SiO/sub 2//Y/sub 2/O/sub 3/. Selection was based on review and compilation of the optical properties of oxide materials reported in the recent literature. Twenty-eight coatings of selected designs were fabricated on LLNL substrates for laser damage testing by LLNL. Forty other coatings were fabricated on PNL substrates for optical, microstructural and topographical characterization by PNL aimed at optimization of their performance. Specimens for damage testing consisted of single layers of Al/sub 2/O/sub 3/, HfO/sub 2/ and Y/sub 2/O/sub 3/ in thicknesses of lambda/2, 3lambda/2 and 2lambda at 248 nm plus high reflectors of the design LL (HL)/sup m/ HLL

Develop techniques for ion implantation of PLZT (lead-lanthanum-zirconate-titanate) for adaptive optics

Research was conducted at Pacific Northwest Laboratory to develop high photosensitivity adaptive optical elements utilizing ion implanted lanthanum-doped lead-zirconate-titanate (PLZT). One centimeter square samples were prepared by implanting ferroelectric and anti-ferroelectric PLZT with a variety of species or combinations of species. These included Ne, O, Ni, Ne/Cr, Ne/Al, Ne/Ni, Ne/O, and Ni/O, at a variety of energies and fluences. An indium-tin oxide (ITO) electrode coating was designed to give a balance of high conductivity and optical transmission at near uv to near ir wavelengths. Samples were characterized for photosensitivity; implanted layer thickness, index of refraction, and density; electrode (ITO) conductivity; and in some cases, residual stress curvature. Thin film anti-ferroelectric PLZT was deposited in a preliminary experiment. The structure was amorphous with x-ray diffraction showing the beginnings of a structure at substrate temperatures of approximately 550/sup 0/C. This report summarizes the research and provides a sampling of the data taken during the report period

Improved manufacturing techniques for RF and laser hardening of missile domes. Phase I. Technical report

This report summarizes key results and accomplishements during the first year of a Manufacturing Methods and Technology project to adapt an existing Pacific Northwest Laboratory (PNL) optical coating capability developed for high-power fusion-laser applications to the case of rf and laser hardening of plastic missile domes used by the US Army (MICOM). The primary objective of the first year's work was to demonstrate rf hardening of Hellfire and Copperhead 1.06-micron missile domes by use of transparent conductive Indium Tin Oxide (ITO) coatings. The project thus involved adaptation of a coating material and process developed for flat glass components used in fusion lasers to the case of hemispherical or conical heat-sensitive plastic domes used on laser-guided missiles. Specific ITO coating property goals were an electrical sheet resistance of 10 Ohms/square, a coated-dome transmission of 80% or more at 1.06 micron wavelength (compared to 90% for a bare dome), and good adhesion. The sheet resistance goal of 10 Ohms/square was expected to result in an rf attenuation of 30 dB at the frequencies of importance