Evolution of Asymmetric Raman line-shape from nano-structures

A step-by-step evolution of an asymmetric Raman line-shape function from a Lorentzian line-shape is presented here for low dimensional semiconductors. The evolution reported here is based on the phonon confinement model which is successfully used in literature to explain the asymmetric Raman line-shape from semiconductor nano-structures. Physical significance of different terms in the theoretical asymmetric Raman line-shape has been explained here. Better understanding of theoretical reasoning behind each term allows one to use the theoretical Raman line-shape without going into details of theory from first principle. This will enable one to empirically derive a theoretical Raman line-shape function for any material if information about its phonon dispersion, size dependence etc is known

Effect of silicon resistivity on its porosification using metal induced chemical etching

A comparison of porous structures formed from silicon (Si) wafers with different resistivities has been reported here based on the morphological studies carried out using scanning electron microscope (SEM). The porous Si samples have been prepared using metal induced etching (MIE) technique from two different Si wafers having two different resistivities. It is observed that porous Si containing well aligned Si nanowires are formed from high resistivity (1-20 $\Omega$cm) Si wafer whereas interconnected pores or cheese like structures are formed from low resistivity (0.02 $\Omega$cm ) Si wafers after MIE. An explanation for the different porosification processes has also been proposed based on the initial doping level where number of dopants seems to be playing an important role on the etching process. Visible photoluminescence have been observed from all the porous samples possibly due to quantum confinement effect.Comment: 9 Pages, 5 Figure

Intrinsic Half-metallicity in Edge Fluorinated Armchair Boron Nitride Nanoribbons

We predict intrinsic half-metallicity in armchair boron nitride nanoribbons (ABNNRs) via edge fluorination. The stability, electronic and magnetic properties of bare and edge fluorinated ABNNRs have been systematically analyzed by means of first-principles calculations within the local spin-density approximation (LSDA). The ribbons whose only edge-B atoms passivated with F atoms (i.e., edge-N atoms are un-passivated), regardless of width, are found half-metallic with a half-metal gap of 0.3 eV. A 100 \% spin polarized charge transport across the Fermi level is expected for such ribbons as the spin polarized states are $\sim$0.4 eV more stable than the spin un-polarized states and only single-spin conducting channels are present across the Fermi level owing to the gigantic spin splitting. The existence of half-metallicity is attributed to the localization of electronic charge at bare edge-N atoms as revealed from the analysis of Bloch states and projected density of states (PDOS).The sufficiently large half-metal gap (0.3 eV) with huge difference in the energies ($\sim$ 0.4 eV) of spin polarized and spin compensated states projects these half-metallic ABNNRs as potential candidate for spintronics applications.Comment: Error in Typing in older versio

In-situ spectroscopic studies of viologen based electrochromic device

Fabrication and operation of simple solid state electrochromic devices using ethyl viologen diperchlorate in a polymer matrix is presented here. In-situ Raman and transmission/absorption studies have been done to establish the origin of bias induced color change, between a transparent and navy blue color, in the electrochromic device. The origin of bias induced color change has been attributed to the bias induced redox switching between its viologen dication and free redicle forms. Fundamental reason behind colour changes of viologen molecule has been established. In-situ UV-Vis spectra reveals that the navy blue color of the device under biased condition is not due to increase in the transparency corresponding to blue wavelength but due to suppression of the transparency corresponding to the complementary colors. Absorption modulation has been reported from the device with good ON/OFF contrast of the device.Comment: 14 Pages, 6 figure

Tent--Shaped Surface Morphologies of Silicon: Texturization by Metal Induced Etching

Nano--metal/semiconductor junction dependent porosification of silicon (Si) has been studied here. The silicon (Si) nanostructures (NS) have been textured on n-- and p-- type silicon wafers using Ag and Au metal nano particles induced chemical etching. The combinations of n--Si/Ag and p--Si/Au form ohmic contact and result in the same texturization on the Si surface on porosification where tent--shaped morphology has been observed consistently with n-- and p--type Si. Whereas, porosification result in different surface texturization for other two combinations (p--Si/Ag and n--Si/Au) where Schottkey contacts are formed. Quantitative analysis have been done using ImageJ to process the SEM images of SiNS, which confirms that the tent like SiNS are formed when etching of silicon wafer is done by AgNPs and AuNPs on n and p type Si wafer respectively. These easily prepared sharp tent--shaped Si NSs can be used for enhanced field emission applications.Comment: 10 Pages, 5 Figure

Generalization of Phonon Confinement Model for Interpretation of Raman Line-Shape from Nano-Silicon

A comparative analysis of two Raman line-shape functions has been carried out to validate the true representation of experimentally observed Raman scattering data for semiconducting nanomaterials. A modified form of already existing phonon confinement model incorporates two basic considerations, phonon momentum conservation and shift in zone centre phonon frequency. After incorporation of the above mentioned two factors, a rather symmetric Raman line-shape is generated which is in contrary to the usual asymmetric Raman line-shapes obtained from nanostructured semiconductor. By fitting an experimentally observed Raman scattering data from silicon nanostructures, prepared by metal induced etching, it can be established that the Raman line-shape obtained within the framework of phonon confinement model is a true representative Raman line-shape of sufficiently low dimensions semiconductors.Comment: 8 pages, 3 figure

Observation, Evidence and Origin of Room Temperature Magnetodielectric Effect in Mn doped LaGaO3

We report an observation of room temperature magnetodielectric (RTMD) effect in Mn doped LaGaO3. Results of frequency dependent magnetoresistance (FDMR) measurements discards the possibility of any magnetoresistive contribution in the observed MD effect. The intrinsic nature of MD coupling has been validated/evidenced by means of magnetic field dependent Raman spectroscopy and explained in terms of modified volume strain governed by magnetic field induced rerotation of spin coupled Mn-orbitals. Ultimately, present RTMD effect is attributed to magneto-compression/magnetostriction associated with spin-phonon coupling as evidenced in the form of magnetic field induced hardening of symmetric stretching (SS) MnO6 octahedral Raman modes. Presently studied Mn doped LaGaO3 can be a candidate for magnetodielectric applications

Role of Metal Nanoparticles on porosification of silicon by metal induced etching (MIE)

Porosification of silicon (Si) by metal induced etching (MIE) process have been studies here to understand the etching mechanism. The etching mechanism has been discussed on the basis of electron transfer from Si to metal ion (Ag$^+$) and metal to H$_2$O$_2$. Role of silver nanoparticles (AgNPs) in the etching process has been investigated by studying the effect of AgNPs coverage on surface porosity. A quantitative analysis of SEM images, done using Image J, shows a direct correlation between AgNPs coverage and surface porosity after the porosification. Density of Si nanowires (NWs) also varies as a function of AgNPs fractional coverage which reasserts the fact that AgNPs governs the porosification process during MIE.Comment: 8 pages, 5 figure

Interplay between Phonon Confinement and Fano Effect on Raman line shape for semiconductor nanostructures: Analytical study

Theoretical Raman line shape functions have been studied to take care of quantum confinement effect and Fano effect individually and jointly. The characteristics of various Raman line shapes have been studied in terms of the broadening and asymmetry of Raman line shapes. It is shown that the asymmetry in the Raman line-shape function caused by these two effects individually does not add linearly to give asymmetry of line-shape generated by considering the combined effect. This indicates existence of interplay between the two effects. The origin of interplay lies in the fact that Fano effect itself depends on quantum confinement effect and in turn provides an asymmetry. This can not be explained by considering the two effects contribution independent of each other.Comment: 10 Page

Comparison of porous silicon prepared using metal-induced etching (MIE) and laser-induced etching (LIE)

Porous silicon (p-Si), prepared by two routes (metal induced etching (MIE) and laser induced etching (LIE)) have been studied by comparing the observed surface morphologies using SEM. A uniformly distributed smaller (submicron sized) pores are formed when MIE technique is used because the pore formation is driven by uniformly distributed metal (silver in present case) nanoparticles, deposited prior to the porosification step. Whereas in p-Si, prepared by LIE technique, wider pores with some variation in pore size as compared to MIE technique is observed because a laser having gaussian profile of intensity is used for porosification. Uniformly distribute well-aligned Si nanowires are observed in samples prepared by MIE method as seen using cross-sectional SEM imaging. A single photoluminescence (PL) peak at 1.96 eV corresponding to red emission at room temperature is observed which reveals that the Si nanowires, present in p-Si prepared by MIE, show quantum confinement effect. The single PL peak confirms the presence of uniform sized nanowires in MIE samples. These vertically aligned Si nanowires can be used for field emission application