A proposal on the first Japanese practical guidance for the return of individual genomic results in research settings

Aizawa, Y., Nagami, F., Ohashi, N. et al. A proposal on the first Japanese practical guidance for the return of individual genomic results in research settings. J Hum Genet (2019). doi:10.1038/s10038-019-0697-y

Stitching interferometry for ellipsoidal x-ray mirrors

Ellipsoidal mirrors, which can efficiently produce a two-dimensional focusing beam with a single mirror, are superior x-ray focusing optics, especially when compared to elliptical-cylinder mirrors in the Kirkpatrick-Baez geometry. However, nano-focusing ellipsoidal mirrors are not commonly used for x-ray optics because achieving the accuracy required for the surface metrology of nano-focusing ellipsoidal mirrors is difficult due to their small radius of curvature along the short ellipsoidal axis. Here, we developed a surface metrology system for nano-focusing ellipsoidal mirrors using stitching interferometric techniques. The developed system simultaneously measures sub-aperture shapes with a microscopic interferometer and the tilt angles of the sub-aperture shapes with a large Fizeau interferometer. After correcting the systematic errors included in the sub-aperture shapes, the entire mirror shape is calculated by stitching the sub-aperture shapes based on the obtained relative angles between partially overlapped sub-apertures. In this study, we developed correction methods for systematic errors in sub-aperture shapes that originated from off-axis aberrations produced in the optics of the microscopic interferometer. The systematic errors on an ellipsoidal mirror were estimated by measuring a series of tilted plane substrates and the ellipsoidal substrate. From measurements of an ellipsoidal mirror with a 3.6-mm radius of curvature at the mirror center, we obtained a measurement repeatability of 0.51 nm (root-mean-square) in an assessment area of 0.5 mm × 99.18 mm. This value satisfies the requirements for surface metrology of nano-focusing x-ray mirrors. Thus, the developed metrology system should be applicable for fabricating nano-focusing ellipsoidal mirrors.Hirokatsu Yumoto, Takahisa Koyama, Satoshi Matsuyama, Kazuto Yamauchi, and Haruhiko Ohashi, "Stitching interferometry for ellipsoidal x-ray mirrors", Review of Scientific Instruments 87, 051905 (2016) https://doi.org/10.1063/1.4950714

Towards high-resolution ptychographic x-ray diffraction microscopy

Ptychographic x-ray diffraction microscopy is a lensless imaging technique with a large field of view and high spatial resolution, which is also useful for characterizing the wavefront of an x-ray probe. The performance of this technique is degraded by positioning errors due to the drift between the sample and illumination optics. We propose an experimental approach for correcting the positioning errors and demonstrate success by two-dimensionally reconstructing both the wavefront of the focused x-ray beam and the complex transmissivity of the weakly scattering objects at the pixel resolution of better than 10 nm in the field of view larger than 5 μm. This method is applicable to not only the observation of organelles inside cells or nano-mesoscale structures buried within bulk materials but also the characterization of probe for single-shot imaging with x-ray free electron lasers. © 2011 American Physical Society.Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi, and Tetsuya Ishikawa. Phys. Rev. B 83(21), 214109 (2011)

Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror

Haruhiko Ohashi, Takashi Tsumura, Hiromi Okada, Hidekazu Mimura, Tatsuhiko Masunaga, Yasunori Senba, Shunji Goto, Kazuto Yamauchi, and Tetsuya Ishikawa "Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror", Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670405 (1 October 2007); https://doi.org/10.1117/12.733476

Damage characteristics of platinum/carbon multilayers under X-ray free-electron laser irradiation

Jangwoo Kim, Takahisa Koyama, Hirokatsu Yumoto, Ayaka Nagahira, Satoshi Matsuyama, Yasuhisa Sano, Makina Yabashi, Haruhiko Ohashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Damage characteristics of platinum/carbon multilayers under x-ray free-electron laser irradiation", Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480S (27 September 2013); https://doi.org/10.1117/12.2022735

Measurement of the X-ray spectrum of a free electron laser with a wide-range high-resolution single-shot spectrometer

We developed a single-shot X-ray spectrometer for wide-range high-resolution measurements of Self-Amplified Spontaneous Emission (SASE) X-ray Free Electron Laser (XFEL) pulses. The spectrometer consists of a multi-layer elliptical mirror for producing a large divergence of 22 mrad around 9070 eV and a silicon (553) analyzer crystal. We achieved a wide energy range of 55 eV with a fine spectral resolution of 80 meV, which enabled the observation of a whole SASE-XFEL spectrum with fully-resolved spike structures. We found that a SASE-XFEL pulse has around 60 longitudinal modes with a pulse duration of 7.7 ± 1.1 fs.Inubushi, Y.; Inoue, I.; Kim, J.; Nishihara, A.; Matsuyama, S.; Yumoto, H.; Koyama, T.; Tono, K.; Ohashi, H.; Yamauchi, K.; Yabashi, M. Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer. Appl. Sci. 2017, 7, 584. https://doi.org/10.3390/app7060584

Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation

X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μ4m focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO2), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.Takahisa Koyama, Hirokatsu Yumoto, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, and Haruhiko Ohashi "Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation", Proc. SPIE 9511, Damage to VUV, EUV, and X-ray Optics V, 951107 (12 May 2015); https://doi.org/10.1117/12.218277

Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories

This paper presents the first series of round-robin metrology measurements of x-ray mirrors organized at the Advanced Photon Source (APS) in the USA, the European Synchrotron Radiation Facility in France, and the Super Photon Ring (SPring-8) (in a collaboration with Osaka University,) in Japan. This work is part of the three institutions' three-way agreement to promote a direct exchange of research information and experience amongst their specialists. The purpose of the metrology round robin is to compare the performance and limitations of the instrumentation used at the optical metrology laboratories of these facilities and to set the basis for establishing guidelines and procedures to accurately perform the measurements. The optics used in the measurements were selected to reflect typical, as well as state of the art, in mirror fabrication. The first series of the round robin measurements focuses on flat and cylindrical mirrors with varying sizes and quality. Three mirrors (two flats and one cylinder) were successively measured using long trace profilers. Although the three facilities' LTPs are of different design, the measurements were found to be in excellent agreement. The maximum discrepancy of the rms slope error values is 0.1 μrad, that of the rms shape error was 3 nm, and they all relate to the measurement of the cylindrical mirror. The next round-robin measurements will deal with elliptical and spherical optics.Lahsen Assoufid, Amparo Rommeveaux, Haruhiko Ohashi, Kazuto Yamauchi, Hidekazu Mimura, Jun Qian, Olivier Hignette, Tetsuya Ishikawa, Christian Morawe, Albert Macrander, Ali Khounsary, and Shunji Goto "Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210J (16 September 2005); https://doi.org/10.1117/12.623209.Optics and Photonics 2005, 2005, San Diego, California, United State

Damage threshold of coating materials on x-ray mirror for x-ray free electron laser

We evaluated the damage threshold of coating materials such as Mo, Ru, Rh, W, and Pt on Si substrates, and that of uncoated Si substrate, for mirror optics of X-ray free electron lasers (XFELs). Focused 1 μm (full width at half maximum) XFEL pulses with the energies of 5.5 and 10 keV, generated by the SPring-8 angstrom compact free electron laser (SACLA), were irradiated under the grazing incidence condition. The damage thresholds were evaluated by in situ measurements of X-ray reflectivity degradation during irradiation by multiple pulses. The measured damage fluences below the critical angles were sufficiently high compared with the unfocused SACLA beam fluence. Rh coating was adopted for two mirror systems of SACLA. One system was a beamline transport mirror system that was partially coated with Rh for optional utilization of a pink beam in the photon energy range of more than 20 keV. The other was an improved version of the 1 μm focusing mirror system, and no damage was observed after one year of operation.Takahisa Koyama, Hirokatsu Yumoto, Takanori Miura, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, and Haruhiko Ohashi, "Damage threshold of coating materials on x-ray mirror for x-ray free electron laser", Review of Scientific Instruments 87, 051801 (2016) https://doi.org/10.1063/1.4950723

Systematic-error-free wavefront measurement using an X-ray single-grating interferometer

In this study, the systematic errors of an X-ray single-grating interferometer based on the Talbot effect were investigated in detail. Non-negligible systematic errors induced by an X-ray camera were identified and a method to eliminate the systematic error was proposed. Systematic-error-free measurements of the wavefront error produced by multilayer focusing mirrors with large numerical apertures were demonstrated at the SPring-8 Angstrom Compact free electron LAser. Consequently, wavefront aberration obtained with two different cameras was found to be consistent with an accuracy better than λ/12.Takato Inoue, Satoshi Matsuyama, Shogo Kawai, Hirokatsu Yumoto, Yuichi Inubushi, Taito Osaka, Ichiro Inoue, Takahisa Koyama, Kensuke Tono, Haruhiko Ohashi, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi, "Systematic-error-free wavefront measurement using an X-ray single-grating interferometer", Review of Scientific Instruments 89, 043106 (2018), https://doi.org/10.1063/1.5026440