Age composition, growth, and reproduction of koi carp (Cyprinus carpio L.) in the lower Waikato, New Zealand

A total of 566 koi carp (Cyprinus carpio) from the lower Waikato region were aged from scales and opercular bones, and growth was modelled with the von Bertalanffy growth function. There was no difference in growth rate between male and female carp. Growth of koi carp between zero and 3 years of age was lower than that of common carp in Europe and Australia. However, after 5 years of age the growth of koi carp was higher than that of common carp in Europe, but still below that of carp in Australia. Males rarely lived in excess of 8 years, whereas females lived to 12 years. Mean total fecundity calculated from 44 running-ripe females was 299 000 oocytes (±195 600 SD) (range 29 800–771 000). Relative fecundity ranged from 19 300 to 216 000 oocytes kg–1 total body weight, with a mean of 97 200 (±35 000 SD) oocytes kg–1. Feral koi carp in the Waikato are capable of multiple spawnings within their lifetimes. Within a spawning season, Waikato populations of feral koi carp contained females that spawned once, and females that had the potential to have spawned repeatedly. Female gonadosomatic index (GSI) varied with season and was negatively related to water temperature

In vivo parasitological measures of artemisinin susceptibility

Parasite clearance data from 18,699 patients with falciparum malaria treated with an artemisinin derivative in areas of low (n=14,539), moderate (n=2077), and high (n=2083) levels of malaria transmission across the world were analyzed to determine the factors that affect clearance rates and identify a simple in vivo screening measure for artemisinin resistance. The main factor affecting parasite clearance time was parasite density on admission. Clearance rates were faster in high-transmission settings and with more effective partner drugs in artemisinin-based combination treatments (ACTs). The result of the malaria blood smear on day 3 (72 h) was a good predictor of subsequent treatment failure and provides a simple screening measure for artemisinin resistance. Artemisinin resistance is highly unlikely if the proportion of patients with parasite densities of <100,000 parasites/microL given the currently recommended 3-day ACT who have a positive smear result on day 3 is <3%; that is, for n patients the observed number with a positive smear result on day 3 does not exceed (n + 60)/24

Small molecule screening in zebrafish: an in vivo approach to identifying new chemical tools and drug leads

In the past two decades, zebrafish genetic screens have identified a wealth of mutations that have been essential to the understanding of development and disease biology. More recently, chemical screens in zebrafish have identified small molecules that can modulate specific developmental and behavioural processes. Zebrafish are a unique vertebrate system in which to study chemical genetic systems, identify drug leads, and explore new applications for known drugs. Here, we discuss some of the advantages of using zebrafish in chemical biology, and describe some important and creative examples of small molecule screening, drug discovery and target identification

Iodine-ethanol surface passivation for measurement of millisecond carrier lifetimes in silicon wafers with different crystallographic orientations

To improve silicon device fabrication processes it is necessary to monitor bulk minority carrier lifetimes accurately, and this requires surface recombination to be well controlled and, ideally, minimized. Good surface passivation can result from thermal oxidation or by deposition of dielectrics (e.g. Al2O3, SiNx, amorphous Si), but these forms of passivation can modify the lifetime of the material under investigation. Various schemes can passivate surfaces on a temporary basis without modifying the bulk, and, in this paper, the virtues of the iodine‐ethanol temporary surface passivation scheme are explored. A procedure for preparing the wafer surfaces prior to passivation is developed. For the optimised pre‐treatment, a series of experiments on 3–5 Ωcm float‐zone wafers cut from the same ingot with different thicknesses is conducted. This enables the material's bulk lifetime to be measured at 1015 cm−3 injection as ≈46 ms, with the surface recombination velocity being 6.5 ± 0.3 cm s−1. Iodine‐ethanol passivation is then compared to a recently developed superacid‐derived temporary passivation scheme. Although the latter is superior on (100)‐orientation substrates, iodine‐ethanol performs much better on (111)‐orientation substrates, making it a better choice for (111)‐orientation wafers, such as those used for power devices

Double Exposure Materials: Simulation Study of Feasibility

Double patterning and double exposure techniques have been proposed as possible methods for reducing half pitch resolution below k1=0.25. Both methods have the potential to reduce the theoretical lithographic half pitch to k1=0.125. Double patterning is a process-intensive method that requires multiple coat, develop, and etch steps to achieve the low k1 imaging. Double exposure processes have been proposed that do not require multiple coat, develop, or etch steps. Potentially, double exposure processes will have a lower cost of ownership that double patterning. However, double exposure materials have not yet been proven to work experimentally. Before applying significant effort to develop double exposure materials, their feasibility can be determined using rigorous simulation techniques. This work presents a feasibility study of four types of double exposure materials and their potential process windows

Materials modeling and development for use in double-exposure lithography applications

The current optical photolithography technology is approaching the physical barrier to the minimum achievable feature size. To produce smaller devices, new resolution enhancement technologies must be developed. Double-exposure lithography has shown promise as a potential pathway that is attractive because it is much cheaper than double-patterning lithography and can be deployed on existing imaging tools. However, this technology is not possible without the development of new materials with nonlinear response to exposure dose. The performance of existing materials such as reversible contrast enhancement layers (rCELs), and theoretical materials such as intermediate state two-photon (ISTP) and optical threshold layer (OTL) materials in double-exposure applications have been investigated through computer simulation. All three materials yielded process windows in double-exposure mode. OTL materials showed the largest process window (depth of focus (DOF) 0.14 µm, exposure latitude (EL) 5.1%). ISTP materials had the next-largest process window (DOF 0.12 µm, EL 3.2%), followed by the rCEL (0.11 µm, 0.58%). This study is an analysis of the feasibility of using the materials in double-exposure mode

Marine Tubeworm Metamorphosis Induced by Arrays of Bacterial Phage Tail–Like Structures

Many benthic marine animal populations are established and maintained by free-swimming larvae that recognize cues from surface-bound bacteria to settle and metamorphose. Larvae of the tubeworm Hydroides elegans, a significant biofouling agent, require contact with surface-bound bacteria to undergo metamorphosis; however, the mechanisms that underpin this microbially mediated developmental transition have been enigmatic. Here, we show that a marine bacterium, Pseudoalteromonas luteoviolacea, produces arrays of phage tail–like structures that trigger metamorphosis of H. elegans. These arrays comprise about 100 contractile structures with outward-facing baseplates, linked by tail fibers and a dynamic hexagonal net. Not only do these arrays suggest a novel form of bacterium-animal interaction, they provide an entry point to understanding how marine biofilms can trigger animal development

An analysis of double exposure lithography options

The current optical photolithography technology is approaching the physical barrier to the minimum achievable feature size. To produce smaller devices, new resolution enhancement technologies must be developed. Double exposure lithography has shown promise as potential pathway that is attractive because it is much cheaper than double patterning lithography and it can be deployed on existing imaging tools. However, this technology is not possible without the development of new materials with nonlinear response to exposure dose. The performance of existing materials such as reversible contrast enhancement layers (rCELs) and theoretical materials such as intermediate state two-photon (ISTP) and optical threshold layer (OTL) materials in double exposure applications was investigated through computer simulation. All three materials yielded process windows in double exposure mode. OTL materials showed the largest process window (DOF 0.137 µm, EL 5.06 %). ISTP materials had the next largest process window (DOF 0.124 µm, EL 3.22 %) followed by the rCEL (0.105 µm, 0.58 %). This study is an analysis of the feasibility of using the materials in double exposure mode