3 research outputs found

    Cross-section doping topography of 4H-SiC VJFETs by various techniques

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    International audienceDifferent methods for cross-section doping topography of SiC Trenched-singly-implanted vertical junction field effect transistors (TSI-VJFETs) are presented with the purpose to determine the doping distribution in the epitaxial structure and the implanted areas
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