Optical constants of beryllium thin layers determined from Mo Be multilayers in spectral range 90 to 134 eV

Mo Be multilayers are promising optical elements for extreme ultraviolet EUV lithography and space optics. Experimentally derived optical constants are necessary for accurate and reliable design of beryllium containing optical coatings. We report optical constants of beryllium derived from synchrotron radiation based reflectivity data of Mo Be multilayers. Results are in good agreement with available data in the literature obtained from the well known absorption measurements of beryllium thin films or foils. We demonstrate synchrotron based at wavelength reflectometry as an accurate and non destructive technique for deriving EUV optical constants for materials that are difficult or unstable to make thin foils for absorption measurement

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative to 6.7 and 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, and La/B multilayers were compared for efficiency at their working wavelengths. It is shown that a transition to 10.5 nm and 11.2 nm may be a solution to the problem of increasing performance and resolution of a projection system

Effect of structural defects of aperiodic multilayer mirrors on the properties of reflected (sub)femtosecond pulses

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