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1 research outputs found
Low temperature cleaning of Si by a H2/AsH3 plasma prior to heteroepitaxial growth of GaAs by metalorganic chemical vapor deposition (MOCVD)
Author
A. D. Huelsman
A. D. Huelsman
+24Â more
A. D. Huelsman
A. Ishizaka
D. W. Shaw
Euijoon Yoon
H. Heinecke
H. K. Choi
H. Kroemer
J. E. Palmer
J. W. Lee
K. Ishida
K. P. Pande
K. P. Pande
M. Akiyama
M. Kawabe
M. Yamaguchi
N. El-Marsy
Patrice Parris
R. A. Rudder
R. Fischer
Rafael Reif
S. M. Koch
Shin Hashimoto
T. J. Donahue
T. Soga
Publication venue
'Springer Science and Business Media LLC'
Publication date
Field of study
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