4 research outputs found
Revisiting surface diffusion in random deposition
An investigation of the effect of surface diffusion in random
deposition model is made by analytical methods and reasoning.
For any given site,
the extent to which a particle can diffuse is decided by
the morphology in the immediate neighbourhood of the site. An
analytical expression is derived to calculate the probability of
a particle at any chosen site to diffuse to a given length,
from first principles.
This method may become particularly important in cases where
obtaining the continuum limit and solving the corresponding
differential equation may not be feasible.
Numerical simulation of
surface diffusion in random deposition model with varying
extents of diffusion are performed and their results
are interpreted in the light of the analytical
calculations.
Systems with surface diffusion show an initial random
deposition-like growth upto monolayer deposition, then
a deviation due to correlation effects and eventual saturation.
An explanation for
this behaviour is discussed and the point of departure
from the linear form is estimated analytically