Intravenous Administration of Substance P Attenuates Mechanical Allodynia Following Nerve Injury by Regulating Neuropathic Pain-Related Factors

This study aimed to investigate the analgesic effect of substance P (SP) in an animal model of neuropathic pain. An experimental model of neuropathic pain, the chronic constriction injury (CCI) model, was established using ICR mice. An intravenous (i.v.) injection of SP (1 nmole/kg) was administered to the mice to examine the analgesic effects of systemic SP on neuropathic pain. Behavioral testing and immunostaining was performed following treatment of the CCI model with SP. SP attenuated mechanical allodynia in a time-dependent manner, beginning at 1 h following administration, peaking at 1 day post-injection, and decaying by 3 days post-injection. The second injection of SP also increased the threshold of mechanical allodynia, with the effects peaking on day 1 and decaying by day 3. A reduction in phospho-ERK and glial fibrillary acidic protein (GFAP) accompanied the attenuation of mechanical allodynia. We have shown for the first time that i.v. administration of substance P attenuated mechanical allodynia in the maintenance phase of neuropathic pain using von Frey's test, and simultaneously reduced levels of phospho-ERK and GFAP, which are representative biochemical markers of neuropathic pain. Importantly, glial cells in the dorsal horn of the spinal cord (L4-L5) of SP-treated CCI mice, expressed the anti-inflammatory cytokine, IL-10, which was not seen in vehicle saline-treated mice. Thus, i.v. administration of substance P may be beneficial for improving the treatment of patients with neuropathic pain, since it decreases the activity of nociceptive factors and increases the expression of anti-nociceptive factors.N

Roll-to-Roll Nanoimprinting Metamaterials

ABSTRACTWe investigated continuous fabrication of a large area 2-D metamaterial comprising a metal dot array on a dielectric coated substrate. We demonstrated patterning of metal dots arrays of varying patterns and shapes with diameter of about 2.5 μm and metal-to-metal spacing from 0.3 to 2.5 μm using a nano-imprinting stamp on a roller. The pattern was first fabricated on a standard photolithography mask, reproduced onto a silicon wafer master mold, and then transferred to a flexible polymer mold that was wrapped around a metal roller. The method was used to pattern a thin Al layer on top of SiO2 on a flexible polymer substrate. The aluminum was coated with a resist and the roller moved over the substrate with adjustable speed and pressure to imprint the fine pattern into the resist. The resist was cured, and a very thin layer of residual resist was removed by RIE, followed by a standard etching treatment for patterning the aluminum layer.The as-etched pattern had very few defects and the optical properties of the metamaterial were excellent and correlated well with simulations. This work has shown that low cost, rapid roll-to-roll processing of 2-D metamaterial structures is possible.</jats:p