Surface properties of Me/Si structures prepared by means of self-ion assisted deposition.

In this paper a composite structure, topography, wettability and nanohardness of a (100) Si surface modified by means of ion-assisted deposition of metal (Me) coatings in conditions of a self-irradiation are discussed

Surface Properties of Me/Si Structures Prepared by Means of Self-Ion Assisted Deposition

In this paper a composite structure, topography, wettability and nanohardness of a (100) Si surface modi ed by means of ion-assisted deposition of metal (Me) coatings in conditions of a self-irradiation are discussed. В данной работе обсуждаются композитная структура, топография, смачиваемость и нанотвердость поверхности (100) Si, модифицированной методом ионного осаждения металлических (Me) покрытий в условиях самоизлучения

Analysis of the composition of Ti-based thin films deposited on silicon by means of self-ion assisted deposition

The composition of Ti-based thin films deposited on silicon using a self-ion assisted deposition (SIAD) methodwas investigated by utilising the Rutherford backscattering spectrometry technique and RUMP simulation code. Состав тонких пленок на основе Ti, нанесенных на кремний с использованием метода самоионно-ассистированного осаждения (SIAD), был исследован с использованием методики спектрометрии обратного рассеяния Резерфорда и кода моделирования RUMP

Topography and water wettability of Mo films evaporated onto glass by means of self-ion assisted deposition

Mo thin film back contact layers for solar cells were deposited onto glass substrates using a self-ion assisted deposition method (SIAD). We have observed that deposition of Mo thin film on glass can be used for receiving surface with desirable topography and water wettability