3 research outputs found
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Metrologies for the Phase Characterization of Attosecond
EUV optics play a key role in attosecond science since only with higher photon energies is it possible to achieve the wide spectral bandwidth required for ultrashort pulses. Multilayer EUV mirrors have been proposed and are being developed to temporally shape (compress) attosecond pulses. To fully characterize a multilayer optic for pulse applications requires not only knowledge of the reflectivity, as a function of photon energy, but also the reflected phase of the mirror. This work develops the metrologies to determine the reflected phase of an EUV multilayer mirror using the photoelectric effect. The proposed method allows one to determine the optic's impulse response and hence its pulse characteristics
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Determining the Critcial Size of EUV Mask Substrate Defects
Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tool. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed
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Studying Nanoscale Magnetism and its Dynamics with Soft X-ray Microscopy
Magnetic soft X-ray microscopy allows for imaging magnetic structures at a spatial resolution down to 15nm and a time resolution in the sub-100ps regime. Inherent elemental specificity can be used to image the magnetic response of individual components such as layers in multilayered systems. This review highlights current achievements and discusses the future potential of magnetic soft X-ray microscopy at fsec X-ray sources where snapshot images of ultrafast spin dynamics with a spatial resolution below 10nm will become feasible