Prospects for the future of narrow bandgap materials

Recently there has been greatly expended interest in narrow bandgap materials. Modern epitaxial techniques and the growing interest in nanostructures have provided areas of application for some of the unique properties of the narrow bandgap material. As always, one of the primary sources of interest is the small bandgap which makes them the material of choice for many applications in the infrared. However, in recent years their other unique properties have been the basis for a broader set of interests in narrow bandgap semiconductors. The type II band offsets (InAs/GaSb) have been the basis for novel tunnel devices and infrared superlattices. The very small effective masses inherent in small bandgap materials make them the obvious candidates in which to observe quantum confinement effects at larger dimensions than in materials of larger effective mass and wider gap. The ease of making electrical contact to some of the materials (ohmic contact to n-InAs) has made them the material of choice for electrical nanostructures. The ability to put in large amounts of magnetic ions to make magnetic semiconductors has led to a number of novel properties. The technical importance of a narrow bandgap and the unique applications promised by some of the other properties of these materials bode well for substantial research in narrow bandgap semiconductors well into the next decade

Transition-metal silicides lattice-matched to silicon

We have used a systematic search to determine all the possible transition-metal silicides that are geometrically lattice-matched to either the (100), (110), or the (111) face of silicon. A short table with the best possible matches is presented here, and a more comprehensive table including slightly worse matches is deposited with the editor

Strain in wet thermally oxidized square and circular mesas

In this paper, we report the observation, through optical microscopy, of drumhead-like patterns in square and circular mesas which have been wet thermally oxidized to completion. Micro-Raman spectroscopy measurements are used to show that these patterns roughly correspond to variations in strain induced in surrounding semiconductor layers by the oxidation process. In addition, the patterns have a specific orientation with respect to the crystallographic axes of the semiconductor. A crystallographic dependence of the oxidation process itself is demonstrated and used to explain the orientation of the drumhead patterns

Effect of cylindrical geometry on the wet thermal oxidation of AlAs

We have investigated the wet thermal oxidation of AlAs in cylindrical geometry, a typical configuration for vertical-cavity surface-emitting lasers. Through both experiment and theoretical calculations, we demonstrate a significantly different time dependence for circular mesas from what has been reported in the literature both in studies of stripes and in a study of circular mesas. We attribute this different time dependence to the effect of geometry on the oxidation

Study of surfaces and interfaces using quantum chemistry techniques

There are a number of difficulties in elucidating the microscopic details of the electronic states at surfaces and interfaces. The first step should be to determine the structure at the surface or interface, but this is difficult experimentally even for the clean, ordered surface and extremely difficult for cases with impurity atoms (e.g., nonordered oxide layers). The theoretical study of such geometries and energy surfaces is the subject of quantum chemistry. We present a review of some of the theoretical techniques from quantum chemistry that are being applied to surfaces. The procedure consists of treating a finite piece of the surface or interface as a molecule. Ab initio calculations are then carried out on the molecule using the generalized valence bond (GVB) method (with additional configuration interaction), thereby incorporating the dominant many‐body effects. The reliability of these techniques is discussed by giving some examples from molecular chemistry and the surfaces of solids. The strengths and weaknesses of this approach are compared with more traditional band theory related methods and are illustrated with various examples

Mapping of AlxGa1–xAs band edges by ballistic electron emission spectroscopy

We have employed ballistic electron emission microscopy (BEEM) to study the energy positions in the conduction band of AlxGa1 – xAs. Epilayers of undoped AlxGa1 – xAs were grown by molecular beam epitaxy on conductive GaAs substrates. The Al composition x took on values of 0, 0.11, 0.19, 0.25, 0.50, 0.80 and 1 so that the material was examined in both the direct and indirect band gap regime. The AlxGa1 – xAs layer thickness was varied from 100 to 500 Å to ensure probing of bulk energy levels. Different capping layers and surface treatments were explored to prevent surface oxidation and examine Fermi level pinning at the cap layer/AlxGa1 – xAs interface. All samples were metallized ex situ with a 100 Å Au layer so that the final BEEM structure is of the form Au/capping layer/AlxGa1 – xAs/bulk GaAs. Notably we have measured the Schottky barrier height for Au on AlxGa1 – xAs. We have also probed the higher lying band edges such as the X point at low Al concentrations and the L point at high Al concentrations. Variations of these critical energy positions with Al composition x were mapped out in detail and compared with findings from other studies. Local variations of these energy positions were also examined and found to be on the order of 30–50 meV. The results of this study suggest that BEEM can provide accurate positions for multiple energy levels in a single semiconductor structure

Nickel layers on indium arsenide

We report here on the preparation and characterization of InAs substrates for in situ deposition of ferromagnetic contacts, a necessary precursor for semiconductor devices based on spin injection. InAs has been grown on InAs(111)A and (100) substrates by molecular-beam epitaxy and then metalized in situ in order to better understand the mechanisms that inhibit spin injection into a semiconductor. Initial x-ray characterization of the samples indicate the presence of nickel arsenides and indium–nickel compounds forming during deposition at temperatures above room temperature. Several temperature ranges have been investigated in order to determine the effect on nickel-arsenide formation. The presence of such compounds at the interface could greatly reduce the spin-injection efficiency and help elucidate previous unsuccessful attempts at measuring spin injection into InAs

Push clocks: a new approach to charge-coupled devices clocking

A new approach to charge-coupled device clocking has been developed—dynamic push clocks. With dynamic push clocks, the charge is transferred by pushing it from one storage site to another. The push clock approach results in a larger signal dynamic range, larger signal-to-noise ratio, and better performance at both high and low frequencies

Ion implantation damage of silicon as observed by optical reflection spectroscopy in the 1 to 6 eV region

Optical reflection spectra of crystalline, sputtered, and ion implanted silicon specimens are presented. Characteristic aspects of the spectra of ion implanted specimens are related to lattice damage