25 research outputs found
Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials
Combined molecular dynamics and Monte Carlo simulations for the deposition of (ultra)nanocrystalline diamond
Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the <tex>Ar^{+}$</tex> ion kinetic energy
Differences between ultrananocrystalline and nanocrystalline diamond growth: theoretical investigation of <tex>C_{x}H_{y}$</tex> species at diamond step edges
Insights into the growth of (ultra)nanocrystalline diamond by combined molecular dynamics and Monte Carlo simulations
On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation
Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm
Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials
International audienceIn this review paper, an overview is given of different modeling efforts for plasmas used for the formation and growth of nanostructured materials. This includes both the plasma chemistry, providing information on the precursors for nanostructure formation, as well as the growth processes itself. We limit ourselves to carbon (and silicon) nanostructures. Examples of the plasma modeling comprise nanoparticle formation in silane and hydrocarbon plasmas, as well as the plasma chemistry giving rise to carbon nanostructure formation, such as (ultra)nanocrystalline diamond ((U)NCD) and carbon nanotubes (CNTs). The second part of the paper deals with the simulation of the (plasma-based) growth mechanisms of the same carbon nanostructures, i.e., (U)NCD and CNTs, both by mechanistic modeling and detailed atomistic simulations