6 research outputs found

    Extreme Ultraviolet Laser-based Table-top Aerial Image Metrology of Lithographic Masks

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    We report the first at-wavelength line edge roughness measurements of patterned EUV lithography masks realized using a table-top aerial imaging system based on a table-top {lambda}=13.2 laser

    Über die (aseptische) Harnstauungsniere

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