Inhibiting the Segregation of Germanium in Silver Nanolayers

It is generally acknowledged that using germanium as a wetting film for silver nanolayers decreases the surface roughness of the metal. However, germanium atoms also tend to segregate towards the surface of silver films, increasing ohmic losses in the structure. Here we propose an Au/Ge/Ag based structure where the segregation of germanium in silver is inhibited. X-ray photoelectron spectroscopy (XPS) results show that for the Au/Ge/Ag system, the surface concentration of germanium drops by an order of magnitude relative to multilayers containing only one type of metal (Ag or Au). We have also observed that the time-dependent decrease in the reflectivity due to localized surface plasmon excitation is less prominent in the case of the Au/Ge/Ag structure than in the case of Ag/Ge/Ag. We provide XPS as well as optical reflectometry results to support that claim

XPS Studies of the Initial Oxidation of Polycrystalline Rh Surface

Increased interest in the oxidation process of polycrystalline rhodium, observed in recent years, is the result of its application in exhaust catalytic converters. However, most studies have involved sample surfaces with low Miller indices. In our research, we investigated polycrystalline rhodium foil containing crystallographically different, highly stepped, µm-sized crystallites. These crystallites were exposed to identical oxidizing conditions. To determine crystallographic orientation, the electron backscattering diffraction (EBSD) method was used. To investigate the initial stages of oxidation on the individual crystallites of Rh, X-ray photoelectron spectroscopy (XPS) studies were performed. The results obtained for the individual crystallites were compared and analyzed using chemical state quantification of XPS data and multivariate statistical analysis (MVA)

Can hydrocarbon contamination influence clay soil grain size composition?

Microstructural (fabric, forces and composition) differences due to hydrocarbon contamination in a clayey soil (glacial till) were studied using scanning electron microscopy (microfabric analysis) and sedimentation bench test (PSD). Uncontaminated and contaminated glacial till from NE Poland (in the area of a fuel terminal) were used for the study. Because the contaminated samples exhibited lower electric charge, the electrostatic repulsive forces in the contaminated samples were much lower than in uncontaminated samples. All sedimentary-based particle size test results gave similar results and were inconclusive to find difference between contaminated and uncontaminated samples. Mastersizer PSD data show smaller aggregates in contaminated in comparison to the uncontaminated sample. The present test's finding may support earlier microstructure investigation results, where diesel-contaminated clay soil shows more open porosity, consisting consequently of looser aggregates, which were easier dispersed in water during Mastersizer measurements than the more coherent uncontaminated clay sample. This in effect increased the percentage of finer than 0.1 mm grain fraction within the broad diameter range in contaminated samples results, in comparison with the uncontaminated sample results

Impact of Methanol Concentration on Properties of Ultra-Nanocrystalline Diamond Films Grown by Hot-Filament Chemical Vapour Deposition

Diamond is a very interesting material with a wide range of properties, making it highly applicable, for example, in power electronics, chemo- and biosensors, tools’ coatings, and heaters. Due to the high demand for this innovative material based on the properties it is already expected to have, it is important to obtain homogeneous diamond layers for specific applications. Doping is often chosen to modify the properties of layers. However, there is an alternative way to achieve this goal and it is shown in this publication. The presented research results reveal that the change in methanol content during the Hot Filament Chemical Vapour Deposition (HF CVD) process is a sufficient factor to tune the properties of deposited layers. This was confirmed by analysing the properties of the obtained layers, which were determined using Raman spectroscopy, scanning electron microscopy (SEM), X-ray diffraction (XRD), and an atomic force microscope (AFM), and the results were correlated with those of X-ray photoelectron spectroscopy (XPS). The results showed that the increasing of the concentration of methanol resulted in a slight decrease in the sp3 phase content. At the same time, the concentration of the -H, -OH, and =O groups increased with the increasing of the methanol concentration. This affirmed that by changing the content of methanol, it is possible to obtain layers with different properties

Copper Nitride Nanowire Arrays—Comparison of Synthetic Approaches

Copper nitride nanowire arrays were synthesized by an ammonolysis reaction of copper oxide precursors grown on copper surfaces in an ammonia solution. The starting Cu films were deposited on a silicon substrate using two different methods: thermal evaporation (30 nm thickness) and electroplating (2 μm thickness). The grown CuO or CuO/Cu(OH)2 architectures were studied in regard to morphology and size, using electron microscopy methods (SEM, TEM). The final shape and composition of the structures were mostly affected by the concentration of the ammonia solution and time of the immersion. Needle-shaped 2–3 μm long nanostructures were formed from the electrodeposited copper films placed in a 0.033 M NH3 solution for 48 h, whereas for the copper films obtained by physical vapor deposition (PVD), well-aligned nano-needles were obtained after 3 h. The phase composition of the films was studied by X-ray diffraction (XRD) and selected area electron diffraction (SAED) analysis, indicating a presence of CuO and Cu(OH)2, as well as Cu residues. Therefore, in order to obtain a pure oxide film, the samples were thermally treated at 120–180 °C, after which the morphology of the structures remained unchanged. In the final stage of this study, Cu3N nanostructures were obtained by an ammonolysis reaction at 310 °C and studied by SEM, TEM, XRD, and spectroscopic methods. The fabricated PVD-derived coatings were also analyzed using a spectroscopic ellipsometry method, in order to calculate dielectric function, band gap and film thickness

Copper Nitride Nanowire Arrays—Comparison of Synthetic Approaches

Copper nitride nanowire arrays were synthesized by an ammonolysis reaction of copper oxide precursors grown on copper surfaces in an ammonia solution. The starting Cu films were deposited on a silicon substrate using two different methods: thermal evaporation (30 nm thickness) and electroplating (2 μm thickness). The grown CuO or CuO/Cu(OH)2 architectures were studied in regard to morphology and size, using electron microscopy methods (SEM, TEM). The final shape and composition of the structures were mostly affected by the concentration of the ammonia solution and time of the immersion. Needle-shaped 2–3 μm long nanostructures were formed from the electrodeposited copper films placed in a 0.033 M NH3 solution for 48 h, whereas for the copper films obtained by physical vapor deposition (PVD), well-aligned nano-needles were obtained after 3 h. The phase composition of the films was studied by X-ray diffraction (XRD) and selected area electron diffraction (SAED) analysis, indicating a presence of CuO and Cu(OH)2, as well as Cu residues. Therefore, in order to obtain a pure oxide film, the samples were thermally treated at 120–180 °C, after which the morphology of the structures remained unchanged. In the final stage of this study, Cu3N nanostructures were obtained by an ammonolysis reaction at 310 °C and studied by SEM, TEM, XRD, and spectroscopic methods. The fabricated PVD-derived coatings were also analyzed using a spectroscopic ellipsometry method, in order to calculate dielectric function, band gap and film thickness

The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO2 Layers Produced by Means of the E-BEAM Technique

Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, transmission electron microscopy, and spectroscopic ellipsometry. The applied experimental techniques allowed us to characterize the phase composition and the phase transformation of the fabricated TiO2 coatings. The films produced at room temperature are amorphous but after annealing consist of anatase crystallites. The layers fabricated at 227 °C contain both anatase and rutile phases. In this case the anatase crystallites are accumulated near the substrate interface whilst the rutile crystallites were formed closer to the surface of the TiO2 film. It should be emphasized that these two phases of TiO2 are distinctly separated from each other

Microstructure and Optical Properties of E-Beam Evaporated Zinc Oxide Films—Effects of Decomposition and Surface Desorption

Zinc oxide films have been fabricated by the electron beam physical vapour deposition (PVD) technique. The effect of substrate temperature during fabrication and annealing temperature (carried out in ultra high vacuum conditions) has been investigated by means of atomic force microscopy, scanning electron microscopy, powder X-ray diffraction, X-ray photoelectron spectroscopy and spectroscopic ellipsometry. It was found that the layer deposited at room temperature is composed of Zn and ZnO crystallites with a number of orientations, whereas those grown at 100 and 200 ∘C consist of ZnO grains and exhibit privileged growth direction. Presented results clearly show the influence of ZnO decomposition and segregation of Zn atoms during evaporation and post-deposition annealing on microstructure and optical properties of zinc oxide films

Influence of the Microstructure and Optical Constants on Plasmonic Properties of Copper Nanolayers

Copper layers with thicknesses of 12, 25, and 35 nm were thermally evaporated on silicon substrates (Si(100)) with two different deposition rates 0.5 and 5.0 Å/s. The microstructure of produced coatings was studied using atomic force microscopy (AFM) and powder X-ray diffractometer (XRD). Ellipsometric measurements were used to determine the effective dielectric functions <ε˜> as well as the quality indicators of the localized surface plasmon (LSP) and the surface plasmon polariton (SPP). The composition and purity of the produced films were analysed using X-ray photoelectron spectroscopy (XPS)