8 research outputs found
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Absolute surface metrology of X-ray telescope mirrors through axial shift mapping
The next generation of X-ray telescopes will require mirror segments to be characterized to a surface uncertainty of 5 nm RMS or better. We present axial shift mapping, a Fizeau interferometry method to characterized near-cylindrical null correctors and surfaces. We extend our previously tested technique to cylindrical optics of similar dimensions to X-ray telescope mirrors. We report on progress towards full surface extraction of a cylindrical optic using axial shift mapping. © 2023 SPIE.Immediate accessThis item from the UA Faculty Publications collection is made available by the University of Arizona with support from the University of Arizona Libraries. If you have questions, please contact us at [email protected]
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Lateral shift mapping metrology for X-ray telescope mirrors
Currently, high-resolution X-ray telescope mirrors, such as for the Lynx X-Ray Observatory concept, are measured using a Fizeau interferometer with a cylindrical null corrector. Uncertainties in the null wavefront directly couple into the surface measurement uncertainty, including the axial figure and cone angle variation. We extend the absolute surface metrology method of lateral shift mapping for measuring X-ray telescope mirror segments. Lateral shift mapping involves laterally shifting the surface under test relative to the null to multiple positions. The null wavefront can be extracted from the difference between these shifted measurements, leaving only the surface under test. Accurately extracting quadratic terms of the surface under test requires measuring its tilt during shifting. We will show surface metrology results of optical flats measured by Fizeau-based lateral shift mapping with the required angle measured using an autocollimator and compare these results against a three-flat test. We will show how we plan to extend this method to conical X-ray telescope mirror metrology. The lateral shift mapping method reduces the uncertainty introduced by the cylindrical null, a critical step toward making high-resolution X-ray telescope mirrors. © 2021 SPIE.Immediate accessThis item from the UA Faculty Publications collection is made available by the University of Arizona with support from the University of Arizona Libraries. If you have questions, please contact us at [email protected]
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Axial shift mapping metrology for X-ray telescope mirrors
The next generation of high-resolution X-ray telescopes will require mirror segments characterized to 5 nm uncertainty or better. This is difficult to achieve due to the mirror segment’s off-axis hyperbolic and parabolic shape and the challenge of manufacturing and testing a cylindrical null lens. In a typical Fizeau interferometer setup, errors in the assumed perfect null lens will be coupled into the final surface figure, increasing uncertainty. To combat the higher uncertainty of the cylindrical null corrector, we have been developing lateral shift mapping, an absolute metrology technique using a Fizeau interferometer. In this technique, the surface under test is laterally shifted between measurements while the reference surface does not move. Contributions to the interferogram due to the surface under test will move, while contributions due to the reference will stay static. Using this information, we can extract the true surface under test with low uncertainty. There is a quadratic ambiguity that arises due to the extraction method being akin to an integration. We have shown in the past our ability to utilize lateral shift mapping to extract flat surfaces to sub-nanometer uncertainties by comparing our results to a three-flat test. We also demonstrated that we can eliminate the quadratic ambiguity in flats using an external measurement with an autocollimator. We are expanding this method from optical flats to cylindrical surfaces, creating axial shift mapping. We will report on progress toward sub-nanometer measurements of cylindrical mirrors using axial shift mapping. © 2022 SPIE. All rights reserved.Immediate accessThis item from the UA Faculty Publications collection is made available by the University of Arizona with support from the University of Arizona Libraries. If you have questions, please contact us at [email protected]
Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching
10.1007/s00339-010-5807-9Applied Physics A: Materials Science and Processing1012237-241APAM