5 research outputs found
A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist
- Author
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
Tetrafluoroethylene-based Fluoropolymers for 157-nm Resist Materials
- Author
- B.C. Trinque B.P. Osborn, C.R. Cha
- BAE Y C
- CHIBA T
- CRAWFORD M K
- DAMMEL R R
- FEDYNYSHYN T H
- G. Taylor C.B. Xu, G. Teng, J. Leo
- H. Ito Hoa D. Truong, M. Okazaki,
- ITO H
- KUNZ R R
- M. Koh T. Ishikawa, T. Araki, H. A
- M. Toriumi I. Satoh, and T. Itani
- M. Toriumi N. Shida, H. Watanabe,
- M. Toriumi S. Ishikawa, S. Miyoshi
- M. Toriumi T. Itani, J. Yamashita,
- M.K. Crawford A.E. Feiring, J. Fel
- M.K. Crawford A.E. Feiring, J. Fel
- N. Matsuzawa S. Mori, E. Yano, S.
- N. Shida H. Watanabe, T. Yamazaki,
- OBER C K
- R.R. Dammel R. Sakamuri, S.-H. Lee
- ROTHSCHILD M
- S. Kodama I. Kaneko, Y. Takebe, S.
- SCHMALJOHANN D
- T.H. Fedynyshyn R.R. Kunz, R.F. Si
- T.M. Bloomstein M. Rothschild, R.R
- TORIUMI M
- TRAN H V
- V.R. Vohra K. Douki, Y.-J. Kwark,
- Y. Uetani K. Hashimoto, Y. Miya, I
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
Fluoropolymer Resists: Progress and Properties
- Author
- ANDO S
- CHIBA T
- CONLEY W
- CRAWFORD M K
- FUJIGAYA T
- G.G. Barclay C.J. Hawker, H. Ito,
- H. Ito
- H. Ito G.M. Wallraff, N. Fender, P
- H. Ito G.M. Wallraff, P. Brock, N.
- H. Ito H.D. Truong, M. Okazaki, D.
- H. Ito R.D. Allen, J. Opitz, T.I.
- ITO H
- ITO H
- ITO H
- ITO H
- K. Patterson M. Yamachika, R. Hung
- K.J. Przybilla H. Roschert, and G.
- KISHIMURA S
- M. Toriumi N. Shida, H. Watanabe,
- M. Toriumi T. Yamazaki, T. Furukaw
- M.K. Crawford A.E. Feiring,, J. Fe
- N. Fender P.J. Brock, W. Chau, S.
- N. Shida H. Watanabe, T. Yamazaki,
- N.N. Matsuzawa A. Ishitani, D.A. D
- N.N. Matsuzawa S. Mori, E. Yano, S
- OBER C K
- R.J. Hung H.V. Tran, B.C. Trinque,
- R.R. Kunz T.M. Bloomstein, D.E. Ha
- S. Kodama I. Kaneko, Y. Takebe, S.
- T. Itani M. Toriumi, T. Naito, S.
- TRAN H V
- V.R. Vohra K. Douki, Y.-J. Kwark,
- W.D. Hinsberg S.W. Lee, H. Ito, D.
- WILLSON C G
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
Characterization of Fluoropolymer Resist for 157-nm Lithography
- Author
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography
- Author
- D. Schmaljohann Y.C. Bae, G.L. Wei
- H. Ito G.M. Wallraff, P. Brock, N.
- J. Claypool R. Puligadda, J. Akers
- M. Toriumi S. Ishikawa, S. Miyoshi
- M.K. Crawford A.E. Feiring, J. Fel
- N. Shida H. Watanabe, T. Yamazaki,
- R.J. Hung H.V. Tran, B.C. Trinque,
- S. Kodama I. Kaneko, Y. Takebe, S.
- T.H. Fedynyshyn R.R. Kunz, R.F. Si
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study