Scanning mechanism based on a programmable liquid crystal display

Includes bibliographical references (pages 112-113).In this work we propose a new robust optoelectronic scanning system for scanning microscopy. The device is based on a programmable liquid crystal television display (LCTV) that acts as a pixel-by-pixel controlled pure phase spatial light modulator. The computer addressed liquid crystal screen allows synthesize different diffractive optical elements at video rates. The phase shifts introduced by these elements make possible a complete control over the position and focusing of the scanning beam

Transient magnetic domain wall ac dynamics by means of magneto-optical Kerr effect microscopy

The domain wall response under constant external magnetic fields reveals a complex behavior where sample disorder plays a key role. Furthermore, the response to alternating magnetic fields has only been explored in limited cases and analyzed in terms of the constant field solution. Here we unveil phenomena in the evolution of magnetic domain walls under the application of alternating magnetic fields within the creep regime, well beyond a small fuctuation limit of the domain wall position. Magnetic field pulses were applied in ultra-thin ferromagnetic films with perpendicular anisotropy, and the resulting domain wall evolution was characterized by polar magneto-optical Kerr effect microscopy. Whereas the DC characterization is well predicted by the elastic interface model, striking unexpected features are observed under the application of alternating square pulses: magneto-optical images show that after a transient number of cycles, domain walls evolve toward strongly distorted shapes concomitantly with a modification of domain area. The morphology of domain walls is characterized with a roughness exponent when possible and contrasted with alternative observables which result to be more suitable for the characterization of this transient evolution. The final stationary convergence as well as the underlying physics is discussed.Comment: 9 pages, 8 figure

Table top nanopatterning with extreme ultraviolet laser illumination

Includes bibliographical references (pages 723-724).Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications

Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography

Includes bibliographical references (pages 3465-3466).Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up

Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers

Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for = 46.9 nm radiation a penetration depth in excess of 150 nm. This laser-based extreme ultraviolet interferometric setup allows printing of 0.5ϫ 0.5 mm 2 areas with different nanoscale patterns using a compact tabletop system and exposure times of tens of seconds