Atmospheric-pressure atomic layer deposition:recent applications and new emerging applications in high-porosity/3D materials

Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process with a potentially lower ownership cost of the reactor. In this review, we provide a comprehensive overview of the recent applications and development of ALD approaches emphasizing those based on operation at atmospheric pressure. Each application determines its own specific reactor design. Spatial ALD (s-ALD) has been recently introduced for the commercial production of large-area 2D displays, the surface passivation and encapsulation of solar cells and organic light-emitting diode (OLED) displays. Atmospheric temporal ALD (t-ALD) has opened up new emerging applications such as high-porosity particle coatings, functionalization of capillary columns for gas chromatography, and membrane modification in water treatment and gas purification. The challenges and opportunities for highly conformal coating on porous substrates by atmospheric ALD have been identified. We discuss in particular the pros and cons of both s-ALD and t-ALD in combination with their reactor designs in relation to the coating of 3D and high-porosity materials.</p

Oil-in-water emulsion separation: Fouling of alumina membranes with and without a silicon carbide deposition in constant flux filtration mode

Ceramic membranes have drawn increasing attention in oily wastewater treatment as an alternative to their traditional polymeric counterparts, yet persistent membrane fouling is still one of the largest challenges. Particularly, little is known about ceramic membrane fouling by oil-in-water (O/W) emulsions in constant flux filtration modes. In this study, the effects of emulsion chemistry (surfactant concentration, pH, salinity and Ca2+) and operation parameters (permeate flux and filtration time) were comparatively evaluated for alumina and silicon carbide (SiC) deposited ceramic membranes, with different physicochemical surface properties. The original membranes were made of 100% alumina, while the same membranes were also deposited with a SiC layer to change the surface charge and hydrophilicity. The SiC-deposited membrane showed a lower reversible and irreversible fouling when permeate flux was below 110 L m−2 h−1. In addition, it exhibited a higher permeance recovery after physical and chemical cleaning, as compared to the alumina membranes. Increasing sodium dodecyl sulfate (SDS) concentration in the feed decreased the fouling of both membranes, but to a higher extent in the alumina membranes. The fouling of both membranes could be reduced with increasing the pH of the emulsion due to the enhanced electrostatic repulsion between oil droplets and membrane surface. Because of the screening of surface charge in a high salinity solution (100 mM NaCl), only a small difference in irreversible fouling was observed for alumina and SiC-deposited membranes under these conditions. The presence of Ca2+ in the emulsion led to high irreversible fouling of both membranes, because of the compression of diffusion double layer and the interactions between Ca2+ and SDS. The low fouling tendency and/or high cleaning efficiency of the SiC-deposited membranes indicated their potential for oily wastewater treatment.Sanitary EngineeringWater Managemen

Highly permeable silicon carbide-alumina ultrafiltration membranes for oil-in-water filtration produced with low-pressure chemical vapor deposition

Silicon carbide (SiC) ceramic membranes are of particular significance for wastewater treatment due to their mechanical strength, chemical stability, and antifouling ability. Currently, the membranes are prepared by SiC-particle sintering at a high temperature. The production suffers from long production time and high costs. In this paper, we demonstrated a more economical way to produce SiC ultrafiltration membranes based on low-pressure chemical vapor deposition (LPCVD). SiC was deposited in the pores of alumina microfiltration supports using two precursors (SiH2Cl2 and C2H2/H2) at a relatively low temperature of 750 °C. Different deposition times varying from 0 to 150 min were used to tune membrane pore size. The pure water permeance of the membranes only decreased from 350 Lm−2h−1bar−1 to 157 Lm−2h−1bar−1 when the deposition time was increased from 0 to 120 min due to the narrowing of membrane pore size from 71 to 47 nm. Increasing the deposition time from 120 to 150 min mainly resulted in the formation of a thin, dense layer on top of the support instead of in the pores. Oil-in-water emulsion filtration experiments illustrated that both the reversible and irreversible fouling of the SiC-deposited UF membrane was considerably lower as compared to the pristine alumina support. The unique feature that pore sizes decrease linearly as a function of SiC deposition time creates opportunities to produce low-fouling SiC membranes with tuned pore sizes on relatively cheap support.Sanitary EngineeringEKL Processin

Effect of Long-Term Sodium Hypochlorite Cleaning on Silicon Carbide Ultrafiltration Membranes Prepared via Low-Pressure Chemical Vapor Deposition

Sodium hypochlorite (NaClO) is widely used for the chemical cleaning of fouled ultrafiltration (UF) membranes. Various studies performed on polymeric membranes demonstrate that long-term (&gt;100 h) exposure to NaClO deteriorates the physicochemical properties of the membranes, leading to reduced performance and service life. However, the effect of NaClO cleaning on ceramic membranes, particularly the number of cleaning cycles they can undergo to alleviate irreversible fouling, remains poorly understood. Silicon carbide (SiC) membranes have garnered widespread attention for water and wastewater treatment, but their chemical stability in NaClO has not been studied. Low-pressure chemical vapor deposition (LP-CVD) provides a simple and economical route to prepare/modify ceramic membranes. As such, LP-CVD facilitates the preparation of SiC membranes: (a) in a single step; and (b) at much lower temperatures (700–900 °C) in comparison with sol-gel methods (ca. 2000 °C). In this work, SiC ultrafiltration (UF) membranes were prepared via LP-CVD at two different deposition temperatures and pressures. Subsequently, their chemical stability in NaClO was investigated over 200 h of aging. Afterward, the properties and performance of as-prepared SiC UF membranes were evaluated before and after aging to determine the optimal deposition conditions. Our results indicate that the SiC UF membrane prepared via LP-CVD at 860 °C and 100 mTorr exhibited excellent resistance to NaClO aging, while the membrane prepared at 750 °C and 600 mTorr significantly deteriorated. These findings not only highlight a novel preparation route for SiC membranes in a single step via LP-CVD, but also provide new insights about the careful selection of LP-CVD conditions for SiC membranes to ensure their long-term performance and robustness under harsh chemical cleaning conditions.Sanitary EngineeringChemE/Product and Process Engineerin