Non-Equilibrium Modeling of the Fe XVII 3C/3D ratio for an Intense X-ray Free Electron Laser

We present a review of two methods used to model recent LCLS experimental results for the 3C/3D line intensity ratio of Fe XVII (Bernitt et al. 2012), the time-dependent collisional-radiative method and the density-matrix approach. These are described and applied to a two-level atomic system excited by an X-ray free electron laser. A range of pulse parameters is explored and the effects on the predicted Fe XVII 3C and 3D line intensity ratio are calculated. In order to investigate the behavior of the predicted line intensity ratio, a particular pair of A-values for the 3C and 3D transitions was chosen (2.22 $\times$ 10$^{13}$ s$^{-1}$ and 6.02 $\times$ 10$^{12}$ s$^{-1}$ for the 3C and 3D, respectively), but our conclusions are independent of the precise values. We also reaffirm the conclusions from Oreshkina et al.(2014, 2015): the non-linear effects in the density matrix are important and the reduction in the Fe XVII 3C/3D line intensity ratio is sensitive to the laser pulse parameters, namely pulse duration, pulse intensity, and laser bandwidth. It is also shown that for both models the lowering of the 3C/3D line intensity ratio below the expected time-independent oscillator strength ratio has a significant contribution due to the emission from the plasma after the laser pulse has left the plasma volume. Laser intensities above $\sim 1\times 10^{12}$ W/cm$^{2}$ are required for a reduction in the 3C/3D line intensity ratio below the expected time independent oscillator strength ratio

Study of the Effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS

Inductively Coupled Impulse Sputtering is a promising new technique for highly ionised sputter deposition of materials. It combines pulsed RF-power ICP technology to generate plasma with pulsed high voltage DC bias on the cathode to eliminate the need for a magnetron. To understand the effect of power and pressure on the coating morphology, Copper and Titanium films have been deposited in a power-pressure matrix. The RF-power was increased from 2000 - 4000 W. The pressure was set to 6 Pa and 13 Pa respectively. For Copper, the morphology changes from columnar to fully dense with increasing power and the deposition rate drops from 360 nmh-1 to 210 nmh-1 with higher process pressure. Titanium morphology does not change with power or pressure. The deposition rate is lower than predicted by the differences in sputtering yields at 68 nmh-1 for a pressure of 6 Pa

Updating "small world representations" in strategic decision-making under extreme uncertainty

The behavioral strategy literature investigates how decision makers might use Small World Representations (SWRs) to guide their actions in situations of extreme uncertainty, but says little about how such representations should be updated during the implementation phase. In this paper, we provide a framework to capture the relationship between SWRs, unknowns and Black Swans, and, drawing on the psychology of reasoning literature, explore different heuristic methods of inquiry that decision makers might use to update their SWRs. We compare the performance of two such methods⎯disconfirmation and counterfactual reasoning⎯in highly uncertain situations characterized by ambiguous and non-definite information. We find that counterfactual reasoning is superior to disconfirmation with respect to (1) counteracting the confirmation bias, (2) promoting the exploration of the scenario space, and (3) favoring the adoption of actions able to mitigate or exploit the consequences of Black Swans

Lower entropy bounds and particle number fluctuations in a Fermi sea

We demonstrate, in an elementary manner, that given a partition of the single particle Hilbert space into orthogonal subspaces, a Fermi sea may be factored into pairs of entangled modes, similar to a BCS state. We derive expressions for the entropy and for the particle number fluctuations of a subspace of a fermi sea, at zero and finite temperatures, and relate these by a lower bound on the entropy. As an application we investigate analytically and numerically these quantities for electrons in the lowest Landau level of a quantum Hall sample.Comment: shorter version, typos fixe

A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)

Sputtering magnetic materials with magnetron based systems has the disadvantage of field quenching and variation of alloy composition with target erosion. The advantage of eliminating magnetic fields in the chamber is that this enables sputtered particles to move along the electric field more uniformly. Inductively coupled impulse sputtering (ICIS) is a form of high power impulse magnetron sputtering (HIPIMS) without a magnetic field where a high density plasma is produced by a high power radio frequency (RF) coil in order to sputter the target and ionise the metal vapour. In this emerging technology, the effects of power and pressure on the ionisation and deposition process are not known. The setup comprises of a 13.56 MHz pulsed RF coil pulsed with a duty cycle of 25 %. A pulsed DC voltage of 1900 V was applied to the cathode to attract Argon ions and initiate sputtering. Optical emission spectra (OES) for Cu and Ti neutrals and ions at constant pressure show a linear intensity increase for peak RF powers of 500 W – 3400 W and a steep drop of intensity for a power of 4500 W. Argon neutrals show a linear increase for powers of 500 W – 2300 W and a saturation of intensity between 2300 W – 4500 W. The influence of pressure on the process was studied at a constant peak RF power of 2300 W. With increasing pressure the ionisation degree increased. The microstructure of the coatings shows globular growth at 2.95×10−2 mbar and large-grain columnar growth at 1.2×10−1 mbar. Bottom coverage of unbiased vias with a width of 0.360 μm and aspect ratio of 2.5:1 increased from 15 % to 20 % for this pressure range. The current work has shown that the concept of combining a RF powered coil with a magnet-free high voltage pulsed DC powered cathode is feasible and produces very stable plasma. The experiments have shown a significant influence of power and pressure on the plasma and coating microstructure

Nickel coatings by Inductively Coupled Impulse Sputtering (ICIS)

Inductively Coupled Impulse Sputtering (ICIS) removes the need for a magnetron, whilst delivering equal or higher ion-to-neutral ratios compared to other ionised PVD technologies such as High Power Impulse Magnetron Sputtering (HIPIMS). This is especially advantageous for the sputtering of magnetic materials, as these would shunt the magnetic field of the magnetron, thus reducing the efficiency of the sputtering and ionisation process. ICIS produces highly ionised metal-dominated plasma inside a high power pulsed RF-coil with a magnet free high voltage pulsed DC powered cathode. ICIS operation with magnetic target materials has not been attempted so far. The paper aims to clarify the effects of power and pressure on the chemistry of the deposition flux and is the first investigation of the microstructure of ICIS deposited coatings. Modelling based on the intensity of the optical emission spectra (OES) is conducted for the first time on the excited species of Ni and Ar in relation to the applied RF-power. Sputtered species show a linear intensity increase for increasing peak RF-power and constant process gas pressure. The influence of increasing process gas pressure on the ionisation was studied at a constant peak RF-power for pressures. For pressures below 8 Pa the intensity rises, but then remains constant for pressures up to 26 Pa. The microstructure of Ni coatings shows columnar dendritic or globular growth depending on the ionisation degree. In relation to the film thickness on the top of the substrate, the bottom coverage of unbiased vias with an aspect ratio of 4:1 was 15% and for lower aspect ratios of 1.5:1 was 47.5%. The current work has shown that the concept of combining a pulsed RF driven coil with a magnet-free pulsed DC powered cathode works well for the sputtering of magnetic material in a stable plasma

Plasma analysis of Inductively Coupled Impulse Sputtering of Cu, Ti and Ni

Inductively coupled impulse sputtering (ICIS) is a new development in the field of highly ionised pulsed PVD processes. For ICIS the plasma is generated by an internal inductive coil, replacing the need for a magnetron. To understand the plasma properties, measurements of the current and voltage waveforms at the cathode were conducted. The IEDFs were measured by energy resolved MS and plasma chemistry was analysed by OES and then compared to a model. The target was operated in pulsed DC mode and the coil was energised by pulsed RF power, with a duty cycle of 7.5 %. At a constant pressure (14 Pa) the set peak RF power was varied from 1000-4000 W. The DC voltage to the target was kept constant at 1900 V. OES measurements have shown a monotonic increase in intensity with increasing power. Excitation and ionisation processes were single step for ICIS of Ti and Ni and multi-step for Cu. The latter exhibited an unexpectedly steep rise in ionisation efficiency with power. The IEDFs measured by MS show the material- and time- dependant plasma potential in the range of 10-30 eV, ideal for increased surface mobility without inducing lattice defects. A lower intensity peak, of high energetic ions, is visible at 170 eV during the pulse

Economic Value of Recreational Use of South Australia’s National Parks and Reserves: Kangaroo Island Wilderness Trail Case Study

Eco­nom­ic val­ue of SA’s Parks – Tech­ni­cal report 3 (Kan­ga­roo Island Wilderness Trail Case Study)By: A/Prof Adam Loch, Christopher Auricht and A/Prof Patrick O’Conno

Management succession and success in a professional soccer team

Research into sports team performance has shown that across many sports and league competitions, teams that change their coaches after a decline in performance do rebound, but fare no better on average than teams that have not changed their coach in a similar situation. A similar lack of succession benefits has been reported in studies of manager and CEO succession: it has not been established that changing a team's leader improves a declining team's performance. We study the effect of a change of coach on the performance of a professional soccer team. Based on rarely obtained access to a whole season (one year) of daily close observation of the team and coaching staff in practice and matches, this study uses quantitative and qualitative data to go beyond the "average" pattern reported in the literature. We document in detail how, in a single team case study over an entire season, the processes in leadership behavior changed with a change of coach, the effect this had on the state of mind of the team, how the match behaviors of the players changed, and how these changes translated into improved performance. The process effects of a leadership change on the performance of a sports team may hold insights for leader succession in management: in addition to the aggregate organizational and experience fit of the new team leader, the specific leadership processes introduced by the new leader are critical for performance effects