The fine structure of electron irradiation induced EL2-like defects in n-GaAs

Defects induced by electron irradiation in n-GaAs have been studied using deep level transient spectroscopy (DLTS) and Laplace DLTS (L-DLTS). The E0.83 (EL2) is the only defect observed prior to irradiation. Ru/n-GaAs Schottky diodes were irradiated with high energy electrons from a Sr-90 radionuclide up to a fluence of 2.45 1013 cm 2. The prominent electron irradiation induced defects, E0.04, E0.14, E0.38, and E0.63, were observed together with the metastable E0.17. Using L-DLTS, we observed the fine structure of a broad base EL2-like defect peak. This was found to be made up of the E0.75, E0.83, and E0.85 defects. Our study reveals that high energy electron irradiation increases the concentration of the E0.83 defect and introduces a family of defects with electronic properties similar to those of the EL2.The authors gratefully acknowledge the financial support of the South African National Research Foundation (NRF) and the University of Pretoria.The South African National Research Foundation (NRF) and the University of Pretoria.http://scitation.aip.org/content/aip/journal/japam2016Physic

The effect of high temperatures on the electrical characteristics of Au/n-GaAs Schottky diodes

In this study, the current–voltage (I–V) and capacitance–voltage (C–V) characteristics of Au/n-GaAs Schottky diodes have been measured over a wide temperature range, 80–480 K. The diodes were rectifying throughout the range and showed good thermal stability. Room temperature values for the ideality factor, I–V barrier height and C–V barrier height were found to be n =1.10, ϕIVϕIV=0.85 eV and ϕCVϕCV=0.96 eV, respectively. ϕIVϕIV increases and n decreases with an increase in temperature. We investigated the effect of elevated temperatures on the barrier height and ideality factor by measuring the diodes at a high temperature (annealing mode) then immediately afterwards measuring at room temperature (post annealing mode). The measurements indicate I–V characteristics that degrade permanently above 300 K. Permanent changes to the C–V characteristics were observed only above 400 K. We also noted a discrepancy in the C–V barrier height and carrier concentration between 340 and 400 K, which we attribute to the influence of the EL2 defect (positioned 0.83 eV below the conduction band minima) on the free carrier density. Consequently, we were able to fit the ϕCVϕCV versus temperature curve into two regions with temperature coefficients −6.9×10−4 eV/K and −2.2×10−4 eV/K above and below 400 K.The University of Pretoria and the South African National Research Foundation grant#88021.http://www.journals.elsevier.com/physica-b-condensed-matter2017-01-31hb2016Physic

Electrical characterization of deep levels created by bombarding nitrogen-doped 4HSiC with alpha-particle irradiation

Deep-level transient spectroscopy (DLTS) and Laplace-DLTS were used to investigate the effect of alpha-particle irradiation on the electrical properties of nitrogen-doped 4H-SiC. The samples were bombarded with alpha-particles at room temperature (300 K) using an americium-241 (241Am) radionuclide source. DLTS revealed the presence of four deep levels in the as-grown samples, E0.09, E0.11, E0.16 and E0.65. After irradiation with a fluence of 4.1 × 1010 alpha-particles-cm–2, DLTS measurements indicated the presence of two new deep levels, E0.39 and E0.62 with energy level, EC – 0.39 eV and EC –0.62 eV, with an apparent capture cross sections of 2×10–16 and 2×10–14 cm2, respectively. Furthermore, irradiation with fluence of 8.9×1010 alpha-particles-cm–2 resulted in disappearance of shallow defects due to a lowering of the Fermi level. These defects - minutes. Defects, E0.39 and E0.42 with close emission rates were attributed to silicon or carbon vacancy and could only be separated by using high resolution Laplace-DLTS. The DLTS peaks at EC – (0.55-0.70) eV (known as Z1/Z2) were attributed to an isolated carbon vacancy (VC).This work is based on the research supported in part by the National Research Foundation (NRF) of South African (Grant specific unique reference number (UID) 78838).http://www.elsevier.com/locate/nimb2017-03-31hb2016Physic

Electrical characterization of 5.4 MeV alpha-particle irradiated 4H-SiC with low doping density

Nickel Schottky diodes were fabricated on 4H-SiC. The diodes had excellent current rectification with about ten orders of magnitude between 50 V and +2 V. The ideality factor was obtained as 1.05 which signifies the dominance of the thermionic emission process in charge transport across the barrier. Deep level transient spectroscopy revealed the presence of four deep level defects in the 30–350 K temperature range. The diodes were then irradiated with 5.4 MeV alpha particles up to fluence of 2.6 1010 cm 2. Current–voltage and capacitance–voltage measurements revealed degraded diode characteristics after irradiation. DLTS revealed the presence of three more energy levels with activation enthalpies of 0.42 eV, 0.62 eV and 0.76 eV below the conduction band. These levels were however only realized after annealing the irradiated sample at 200 C and they annealed out at 400 C. The defect depth concentration was determined for some of the observed defects.National Research Foundation (NRF) of South Africa.http://www.elsevier.com/locate/nimb2016-09-30hb201

Electrical characterization of electron irradiated and annealed lowly-doped 4H-SiC

Please read abstract in the article.The University of Pretoria; Postdoctoral Fellowship Program of the University of Pretoria and the National Research Foundation (NRF) of South Africa.http://www.elsevier.com/locate/nimb2018-10-15hj2017Physic

Electrical characterization of high energy electron irradiated Ni/4H-SiC Schottky barrier diodes

The effect of high energy electron (HEE) irradiation on Ni/4H-SiC Schottky barrier diodes was evaluated by current-voltage (I-V) and capacitance-voltage (C-V) measurements at room temperature. Electron irradiation was achieved by using a radioactive strontium source with peak emission energy of 2.3 MeV. Irradiation was performed in fluence steps of 4.9 × 1013 cm–2 until a total fluence of 5.4 × 1014 cm–2 was reached. The Schottky barrier height determined from (I-V) measurements was not significantly changed by irradiation while that obtained from (C-V) measurements increased with irradiation. The ideality factor was obtained before irradiation as 1.05 and this value did not significantly change as a result of irradiation. The series resistance increased from 47 Ω before irradiation to 74 Ω after a total electron fluence of 5.4 × 1014 cm–2. The net donor concentration decreased with increasing irradiation fluence from 4.6 × 1014 cm–3 to 3.0 × 1014 cm–3 from which the carrier removal rate was calculated to be 0.37 cm–1.National Research Foundation (NRF) of South Africahttp://link.springer.com/journal/116642017-08-31hb2016Physic

Laplace current deep level transient spectroscopy measurements of defect states in methylammonium lead bromide single crystals

We present a measurement of the energies and capture cross-sections of defect states in methylammonium lead bromide (MAPbBr3) single crystals. Using Laplace current deep level transient spectroscopy (I-DLTS), two prominent defects were observed with energies 0.17 eV and 0.20 eV from the band edges, and further I-DLTS measurements confirmed that these two defects are bulk defects. These results show qualitative agreement with theoretical predictions, whereby all of the observed defects behave as traps rather than as generation-recombination centers. These results provide one explanation for the high efficiencies and open-circuit voltages obtained from devices made with lead halide perovskites.The Israel Ministry of Science’s Tashtiot program.and the NRF Nanotechnology Flagship Program (Project No. 88021).http://scitation.aip.org/content/aip/journal/jap2018-10-30am2017Physic

Electrical characterization of defects introduced during sputter deposition of tungsten on n type 4H-SiC

We have studied the defects introduced in n-type 4H-SiC during sputter deposition of tungsten using deep-level transient spectroscopy (DLTS). Current-voltage and capacitance-voltage measurements showed a deterioration of diode thermionic emission characteristics due to the sputter deposition. Two electrically active defects E0.29 and E0.69 were introduced. Depth profiling revealed that sputter deposition increases the concentration of the native Z1 defect. A comparison with prominent irradiation and process induced defects showed that the E0.29 was unique and introduced during sputter deposition only. The E0.69 may be silicon vacancy related defect.The South African National Research Foundation and the University of Pretoria.http://www.elsevier.com/locate/mssp2019-07-01hj2018Physic