High Temperature Deformation Behavior of Bulk Metallic Glass and Its Composites

The homogeneous deformation of Zr-based bulk metallic glass composites is studied near the glass transition temperature, at various levels of reinforcement volume fraction. Through examination of the constitutive response, it is seen that the presence of in-situ reinforcements increases the flow resistance of the glass dramatically. This strengthening effect is shown to arise from two separate contributions: load transfer from the amorphous matrix to the reinforcements, and changes to the glass composition and structure upon in-situ precipitation of reinforcements.Singapore-MIT Alliance (SMA

High Temperature Deformation Behavior of in-situ Bulk Metallic Glass Matrix Composites

Macroscopic ductility is promoted in bulk metallic glasses by both composite reinforcements (at low temperatures) and by the activation of viscous flow mechanisms (at high temperatures). It is of fundamental interest to understand deformation physics when both of these strategies are employed at the same time. Despite the quickly growing literature around the room-temperature mechanical properties of metallic glass matrix composites (MGMCs), the deformation behavior of MGMCs over a wide range of temperatures and strain rates has yet to be systematically investigated, especially at high temperatures close to Tg. Here the high temperature compressive behavior of Zr-based MGMCs with in-situ reinforcements is explored systematically over a series of strain rates. Additionally, the volume fraction of second-phase reinforcements was tailored to explore its effect on both inhomogeneous and homogeneous deformation modes.Singapore-MIT Alliance (SMA

Electrodeposition of Ni-Si Schottky barriers

Electrodeposition is being used to fabricate magnetic microstructures directly on patterned n-type Si wafers of various substrate resistivities. The Ni-Si Schottky barrier is characterized and found to be of high quality for relatively low Si resistivities (1-2 Omega(.)cm), with extremely low reverse leakage. It is shown that a direct correlation exists among the electrodeposition potential, the roughness, and the coercivity of the films. A conductive seed layer or a back contact is not compulsory for electrodeposition on Si with resistivities up to 15 Omega(.)cm. This shows that electrodeposition of magnetic materials on Si might be a viable fabrication technique for magnetoresistance and spintronics applications

The rare top quark decays t→cVt\to cV in the topcolor-assisted technicolor model

We consider the rare top quark decays in the framework of topcolor-assisted technicolor (TC2) model. We find that the contributions of top-pions and top-Higgs predicted by the TC2 model can enhance the SM branching ratios by as much as 6-9 orders of magnitude. i.e., in the most case, the orders of magnitude of branching ratios are $Br(t\to c g)\sim 10^{-5}$, $Br(t\to c Z)\sim 10^{-5}$, $Br(t\to c \gamma)\sim 10^{-7}$. With the reasonable values of the parameters in TC2 model, such rare top quark decays may be testable in the future experiments. So, rare top quark decays provide us a unique way to test TC2 model.Comment: 14 pages, 4 figure