Deposition of Platinum from Bis(Acetylacetonato)Platinum(II)

The evaporation and deposition process of Bis(acetylacetonato)platinum(II) (Pt(acac)2) was examined in a computerized microbalance system, which allows the measuring of the mass of evaporating precursor and depositing layer simultaneously. The investigations were carried out in an argon-atmosphere and an argon/oxygen-atmosphere with pressure ranging from 250 Pa to 1000 Pa. The deposition kinetics were investigated in the temperature range between Tdep = 523 K and Tdep = 733 K. A strong dependence of the deposition rate on the pretreatment of the substrate was observed. Beginning the deposition on alumina with low deposition temperatures Tdep an activation energy of 204 [MATH] 9 kJ/mol was found. On platinum precoated substrates we observed higher deposition rates and lower values for the activation energy, if the precoating was carried out at temperature Tpre > Tdep. At long deposition times with Tdep = const. the deposition rates on precoated substrates decreased to the values obtained without precoating at higher temperatures. This effect has not been clarified. In argon-atmosphere platinum layers containing carbon were deposited. Increasing the deposition temperature caused increased carbon contamination. The carbon can be removed by oxidation in air after the deposition. Platinum coatings without carbon contamination were obtained by adding oxygen during the deposition process

Entwicklung von Beschichtungsverfahren fuer die Abscheidung von Y_1Ba_2Cu_3O_6_+_x auf technischen Substraten Abschlussbericht

It was the aim of the project develop CVD techniques for the deposition of superconducting Y_1Ba_2Cu_3O_6_+_x layers on technical substrates. For this purpose two different techniques were developed. Both techniques are based on the principle of adding precursors from a single source. The metalorganic substances were solved in an organic solvent. At first an evaporation source was used in which the solution was nebulized using an ultrasonic nebulizer and then lead into the reactor. During this project a different technique was developed in which the initial compounds are carried into the evaporator by means of a belt and then evaporated continously. Using this principle the negative influence of the solvent vapor in the reactor is impeded. Compared to the traditional multi-source techniques, with both methods a considerable improved process stability was achieved. For monocrystalline substrates the obtained values for T_c and j_c are approx. > 90K resp. > 10"6 A/cm"2 and for polycrystalline substrates the values are about 86K resp. > 10"4 A/cm"2. (orig.)Available from TIB Hannover: F95B2049+a / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekSIGLEBundesministerium fuer Forschung und Technologie (BMFT), Bonn (Germany)DEGerman

Einzelquellen CVD-Verfahren fuer die Abscheidung von Perovskit-Oxidschichten auf Flaechen und komplizierten Formen Abschlussbericht

SIGLEAvailable from TIB Hannover: F99B744+a / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekBundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany)DEGerman