33 research outputs found
Self-injection-locked magnetron as an active ring resonator side coupled to a waveguide with a delayed feedback loop
The theoretical analysis and numerical simulations of the magnetron operation
with a feedback loop were performed assuming that the delay of the
electromagnetic wave propagating in the loop is constant whereas the phase of
the complex feedback reflection coefficient is varied. Results of simulations
showed that by a proper adjustment of values of the time delay and phase of
reflection coefficient that determines phase matching between the waves in the
resonator and feedback loop, one can increase the magnetron's output power
significantly without any other additional measures.Comment: 12 pages, 4 figure
William H. Simon: Thinking like a Lawyer - About Ethics
This is the edited text of a panel discussion held as part of the legal ethics curriculum at Duquesne University Law School on October 24, 1999. The speakers have had the opportunity to update and correct this text; therefore, this printed version may deviate slightly from what was presented
Investigation on the Plasma-Induced Emission Properties of Large Area Carbon Nanotube Array Cathodes with Different Morphologies
Large area well-aligned carbon nanotube (CNT) arrays with different morphologies were synthesized by using a chemical vapor deposition. The plasma-induced emission properties of CNT array cathodes with different morphologies were investigated. The ratio of CNT height to CNT-to-CNT distance has considerable effects on their plasma-induced emission properties. As the ratio increases, emission currents of CNT array cathodes decrease due to screening effects. Under the pulse electric field of about 6 V/μm, high-intensity electron beams of 170–180 A/cm2 were emitted from the surface plasma. The production mechanism of the high-intensity electron beams emitted from the CNT arrays was plasma-induced emission. Moreover, the distribution of the electron beams was in situ characterized by the light emission from the surface plasma
Identifying the Rules of Engagement Enabling Leukocyte Rolling, Activation, and Adhesion
The LFA-1 integrin plays a pivotal role in sustained leukocyte adhesion to the endothelial surface, which is a precondition for leukocyte recruitment into inflammation sites. Strong correlative evidence implicates LFA-1 clustering as being essential for sustained adhesion, and it may also facilitate rebinding events with its ligand ICAM-1. We cannot challenge those hypotheses directly because it is infeasible to measure either process during leukocyte adhesion following rolling. The alternative approach undertaken was to challenge the hypothesized mechanisms by experimenting on validated, working counterparts: simulations in which diffusible, LFA1 objects on the surfaces of quasi-autonomous leukocytes interact with simulated, diffusible, ICAM1 objects on endothelial surfaces during simulated adhesion following rolling. We used object-oriented, agent-based methods to build and execute multi-level, multi-attribute analogues of leukocytes and endothelial surfaces. Validation was achieved across different experimental conditions, in vitro, ex vivo, and in vivo, at both the individual cell and population levels. Because those mechanisms exhibit all of the characteristics of biological mechanisms, they can stand as a concrete, working theory about detailed events occurring at the leukocyte–surface interface during leukocyte rolling and adhesion experiments. We challenged mechanistic hypotheses by conducting experiments in which the consequences of multiple mechanistic events were tracked. We quantified rebinding events between individual components under different conditions, and the role of LFA1 clustering in sustaining leukocyte–surface adhesion and in improving adhesion efficiency. Early during simulations ICAM1 rebinding (to LFA1) but not LFA1 rebinding (to ICAM1) was enhanced by clustering. Later, clustering caused both types of rebinding events to increase. We discovered that clustering was not necessary to achieve adhesion as long as LFA1 and ICAM1 object densities were above a critical level. Importantly, at low densities LFA1 clustering enabled improved efficiency: adhesion exhibited measurable, cell level positive cooperativity
William H. Simon: Thinking like a Lawyer – About Ethics
This is the edited text of a panel discussion held as part of the legal ethics curriculum at Duquesne University Law School on October 24, 1999. The speakers have had the opportunity to update and correct this text; therefore, this printed version may deviate slightly from what was presented
Characterization of deposited films and the electron beam generated in the pulsed plasma deposition gun
The channel spark discharge was used as a high-current density (up to 30 kA/cm2) relatively low-energy (<20 keV) electron beam source in a pulsed plasma deposition (PPD) gun. The PPD gun was used for the deposition of thin films by pulsed ablation of different target materials, at a
background gas pressure in the 103–105 Torr range. The parameters of the electron beam generated in the modified PPD gun were studied using electrical, optical, and X-ray diagnostics. It was found that a higher background pressure stimulates a denser plasma formation between the
gun output and the target, that restricts the energy delivery to the beam electrons. Namely, the efficient (up to 74%) transfer of the initially stored energy to the electron beam is realized at the background gas pressure of 104 Torr. Conversely, at a pressure of 103 Torr, only 10% of the stored energy is acquired by the energetic electrons. It was shown that the modified PPD gun, owing to the extremely high energy density delivered by the electrons to the target, may be applied for the deposition of a wide variety of different insulators, semiconductors, and metals. A selection of materials such as diamond-like carbon (DLC), cadmium telluride (CdTe), cadmium sulphide (CdS), zinc oxide (ZnO), tungsten, and tungsten carbide (WC) have been deposited as thin films and the properties and deposition rates of the deposited thin films are discussed