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    3 research outputs found

    Gas-Phase Selective Etching of Native Oxide

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    'Institute of Electrical and Electronics Engineers (IEEE)'
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    Tohoku University Repository (TOUR) / 東北大学機関リポジトリ
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    Principles of Wet Chemical Processing in ULSI Microfabrication

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    'Institute of Electrical and Electronics Engineers (IEEE)'
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    Tohoku University Repository (TOUR) / 東北大学機関リポジトリ
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    Surface Active Buffered Hydrogen Fluoride Having Excellent Wettability for ULSI Processing

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    Institute of Electrical and Electronics Engineers
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    application/pdf学術論文 (Article)1460269 bytesjournal articl
    Tohoku University Repository (TOUR) / 東北大学機関リポジトリ
    Institutional Repositories DataBase (IRDB)
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