Achieving precision and reproducibility for writing patterns of n-alkanethiol self-assembled monolayers with automated nanografting

Nanografting is a high-precision approach for scanning probe lithography, which provides unique advantages and capabilities for rapidly writing arrays of nanopatterns of thiol self-assembled monolayers (SAMs). Nanografting is accomplished by force-induced displacement of molecules of a matrix SAM, followed immediately by the self-assembly of n-alkanethiol ink molecules from solution. The feedback loop used to control the atomic force microscope tip position and displacement enables exquisite control of forces applied to the surface, ranging from pico to nanonewtons. To achieve high-resolution writing at the nanoscale, the writing speed, direction, and applied force need to be optimized. There are strategies for programing the tip translation, which will improve the uniformity, alignment, and geometries of nanopatterns written using open-loop feedback control. This article addresses the mechanics of automated nanografting and demonstrates results for various writing strategies when nanografting patterns of n-alkanethiol SAMs. © 2008 Wiley Periodicals, Inc

Impact of pH, Dissolved Inorganic Carbon, and Polyphosphates for the Initial Stages of Water Corrosion of Copper Surfaces Investigated by AFM and NEXAFS

Abstract Nanoscale studies at the early stages of the exposure of copper surfaces after systematic treatments in synthesized water solutions can provide useful information about corrosion processes. The corrosion and passivation of copper surfaces as influenced by pH, dissolved inorganic carbon (DIC) and polyphosphate levels were investigated with nanoscale resolution, to gain insight about changes in surface morphology and the composition of adsorbates. Information regarding the surface morphology after chemical treatment was provided by atomic force microscopy (AFM) and the corresponding chemical composition of treated surfaces was obtained with near-edge X-ray absorption fine structure (NEXAFS). Changes in the surface topography of copper samples were readily detected within only 6 to 24 hours of exposure to water solutions. Topographic views of surface changes are presented to compare the growth of adsorbate layers that take place during the evolution of mineral deposits. Slight changes in the pH and concentrations of phosphates in the water samples have a substantial impact on the rate of growth and composition of surface deposits. These studies provide insight on the mechanisms and resulting chemical constituents that lead to surface passivation or corrosion of copper, simulating conditions that occur in water distribution systems

Nanostructures of functionalized gold nanoparticles prepared by particle lithography with organosilanes

Periodic arrays of organosilane nanostructures were prepared with particle lithography to define sites for selective adsorption of functionalized gold nanoparticles. Essentially, the approach for nanoparticle lithography consists of procedures with two masks. First, latex mesospheres were used as a surface mask for deposition of an organosilane vapor, to produce an array of holes within a covalently bonded, organic thin film. The latex particles were readily removed with solvent rinses to expose discrete patterns of nanosized holes of uncovered substrate. The nanostructured film of organosilanes was then used as a surface mask for a second patterning step, with immersion in a solution of functionalized nanoparticles. Patterned substrates were fully submerged in a solution of surface-active gold nanoparticles coated with 3- mercaptopropyltrimethoxysilane. Regularly shaped, nanoscopic areas of bare substrate produced by removal of the latex mask provided sites to bind silanol-terminated gold nanoparticles, and the methyl-terminated areas of the organosilane film served as an effective resist, preventing nonspecific adsorption on masked areas. Characterizations with atomic force microscopy demonstrate the steps for lithography with organosilanes and functionalized nanoparticles. Patterning was accomplished for both silicon and glass substrates, to generate nanostructures with periodicities of 200-300 nm that match the diameters of the latex mesospheres of the surface masks. Nanoparticles were shown to bind selectively to uncovered, exposed areas of the substrate and did not attach to the methyl-terminal groups of the organosilane mask. Billions of well-defined nanostructures of nanoparticles can be generated using this high-throughput approach of particle lithography, with exquisite control of surface density and periodicity at the nanoscale. © 2011 American Chemical Society

Particle lithography with vapor deposition of organosilanes: A molecular toolkit for studying confined surface reactions in nanoscale liquid volumes

Combining particle lithography with molecular self-assembly provides a practical approach for producing 2D arrays of organosilane nanostructures with well-defined geometries and designated surface coverage. By combining heated chemical vapor deposition with particle lithography, the binding of organosilanes on substrates is narrowly confined to the locations of water residues surrounding the base of latex spheres. Localized meniscus sites of water designate specific locations for the hydrolysis and condensation reactions of organosilanes. With particle lithography, billions of regular nanopatterns can be generated with high throughput to provide exquisite nanoscale control of the geometry, density and surface coverage of organosilane nanostructures. In this report, examples of organosilane nanopatterns presenting different terminal groups and chain lengths are demonstrated with atomic force microscopy images. The effect of the terminal moieties of organosilanes was investigated for nanostructures prepared by particle lithography by evaluating parameters of the number density, surface coverage and thickness of layers formed. © 2010 Elsevier B.V. All rights reserved

Engineering the spatial selectivity of surfaces at the nanoscale using particle lithography combined with vapor deposition of organosilanes

Particle lithography is a practical approach to generate millions of organosilane nanostructures on various surfaces, without the need for vacuum environments or expensive instrumentation. This report describes a stepwise chemistry route to prepare organosilane nanostructures and then apply the patterns as a spatially selective foundation to attach gold nanoparticles. Sites with thiol terminal groups were sufficiently small to localize the attachment of clusters of 2-5 nanoparticles. Basic steps such as centrifuging, drying, heating, and rinsing were used to generate arrays of regular nanopatterns. Close-packed films of monodisperse latex spheres can be used as an evaporative mask to spatially direct the placement of nanoscopic amounts of water on surfaces. Vapor phase organosilanes deposit selectively at areas of the surface containing water residues to generate nanostructures with regular thickness, geometry, and periodicity as revealed in atomic force microscopy images. The area of contact underneath the mesospheres is effectively masked for later synthetic steps, providing exquisite control of surface coverage and local chemistry. By judicious selection in designing the terminal groups of organosilanes, surface sites can be engineered at the nanoscale for building more complex structures. The density of the nanopatterns and surface coverage scale predictably with the diameter of the mesoparticle masks. The examples presented definitively illustrate the capabilities of using the chemistry of molecularly thin films of organosilanes to spatially define the selectivity of surfaces at very small size scales. ©2009 American Chemical Society

Semiconducting polymer thin films by surface-confined stepwise click polymerization

Surface-confined stepwise click polymerization was used to prepare surface-attached thin films of semiconducting polymers. These highly uniform films showed extended UV/vis absorption characteristics and a remarkable degree of molecular organization with a unidirectional alignment of the polymer chains normal to the surface. © 2011 The Royal Society of Chemistry

Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

Particle lithography offers generic capabilities for the high-throughput fabrication of nanopatterns from organosilane self-assembled monolayers, which offers the opportunity to study surface-based chemical reactions at the molecular level. Nanopatterns of octadecyltrichlorosilane (OTS) were prepared on surfaces of Si(111) using designed protocols of particle lithography combined with either vapor deposition, immersion, or contact printing. Changing the physical approaches for applying molecules to masked surfaces produced OTS nanostructures with different shapes and heights. Ring nanostructures, nanodots and uncovered pores of OTS were prepared using three protocols, with OTS surface coverage ranging from 10% to 85%. Thickness measurements from AFM cursor profiles were used to evaluate the orientation and density of the OTS nanostructures. Differences in the thickness and morphology of the OTS nanostructures are disclosed based on atomic force microscopy (AFM) images. Images of OTS nanostructures prepared on Si(111) that were generated by the different approaches provide insight into the self-assembly mechanism of OTS, and particularly into the role of water and solvents in hydrolysis and silanation

Polythiophene thin films by surface-initiated polymerization: Mechanistic and structural studies

© 2016 American Chemical Society. The ability to control nanoscale morphology and molecular organization in organic semiconducting polymer thin films is an important prerequisite for enhancing the efficiency of organic thin-film devices including organic light-emitting and photovoltaic devices. The current top-down paradigm for making such devices is based on utilizing solution-based processing (e.g., spin-casting) of soluble semiconducting polymers. This approach typically provides only modest control over nanoscale molecular organization and polymer chain alignment. A promising alternative to using solutions of presynthesized semiconducting polymers pursues instead a bottom-up approach to prepare surface-grafted semiconducting polymer thin films by surface-initiated polymerization of small-molecule monomers. Herein, we describe the development of an efficient method to prepare polythiophene thin films utilizing surface-initiated Kumada catalyst transfer polymerization. In this study, we provided evidence that the surface-initiated polymerization occurs by the highly robust controlled (quasi- living ) chain-growth mechanism. Further optimization of this method enabled reliable preparation of polythiophene thin films with thickness up to 100 nm. Extensive structural studies of the resulting thin films using X-ray and neutron scattering methods as well as ultraviolet photoemission spectroscopy revealed detailed information on molecular organization and the bulk morphology of the films, and enabled further optimization of the polymerization protocol. One of the remarkable findings was that surface-initiated polymerization delivers polymer thin films showing complex molecular organization, where polythiophene chains assemble into lateral crystalline domains of about 3.2 nm size, with individual polymer chains folded to form in-plane aligned and densely packed oligomeric segments (7-8 thiophene units per each segment) within each domain. Achieving such a complex mesoscale organization is virtually impossible with traditional methods relying on solution processing of presynthesized polymers. Another significant advantage of surface-confined polymer thin films is their remarkable stability toward organic solvents and other processing conditions. In addition to controlled bulk morphology, uniform molecular organization, and stability, a unique feature of the surface-initiated polymerization is that it can be used for the preparation of large-area uniformly nanopatterned polymer thin films. This was demonstrated using a combination of particle lithography and surface-initiated polymerization. In general, surface-initiated polymerization is not limited to polythiophene but can be also expanded toward other classes of semiconducting polymers and copolymers