60 research outputs found
Electrochemical Characteristics of Amorphous Titanium Carbide Films Produced by Low‐Temperature Metal‐Organic Chemical Vapor Deposition (MOCVD)
No full textReview—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications
No full textErratum: “In Situ Pulsed Deposition Studies of Ce ( tmhd ) 4 on SrS Surfaces for Thin Film Electroluminescent Flat Panel Display Applications” [ J. Electrochem. Soc., (145), 4271]
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Low-temperature metal-organic chemical vapor deposition (LTMOCVD) of device-quality copper films for microelectronic applications
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