1 research outputs found
A universal method for depositing patterned materials in-situ
Current techniques of patterned material deposition require separate steps
for patterning and material deposition. The complexity and harsh working
conditions post serious limitations for fabrication. Here, we introduce a novel
single-step and easy-to-adapt method that can deposit materials in-situ. Its
unique methodology is based on the semiconductor nanoparticle assisted
photon-induced chemical reduction and optical trapping. This universal
mechanism can be used for depositing a large selection of materials including
metals, insulators and magnets, with quality on par with current technologies.
Patterning with several materials together with optical-diffraction-limited
resolution accuracy can be achieved from macroscopic to microscopic scale.
Furthermore, the setup is naturally compatible with optical microscopy based
measurements, thus sample characterisation and material deposition can be
realised in-situ. Various devices fabricated with this method in 2D or 3D show
it is ready for deployment in practical applications. This revolutionary method
will provide a distinct tool in material technology