A comparative study of enterprise system implementations in large North American corporations

This study proposes measurement systems for assessing the success of implementation, challenges of implementation and success of utilization of enterprise systems. The proposed measurement systems are used empirically to assess the level of success and challenges of Canadian and American large corporations in the implementation of enterprise systems. Based on the findings of the study, a comparative analysis of the Canadian and American corporation is presented. The findings show that US firms are more successful in following their ES implementation master plan, in implementation of ES, and face fewer challenges. However, they are relatively less successful in utilizing the ES in comparison to Canadian firms

Fabrication of high aspect ratio nanostructures using capillary force lithography

A new ultraviolet (UV) curable mold consisting of fanctionalized polyurethane with acrylate group (MINS101m, Minuta Tech.) has recently been introduced as an alternative to replace polydimethylsiloxane (PDMS) mold for sub-100-nm lithography. Here, we demonstrate that this mold allows for fabrication of various high aspect ratio nanostructures with an aspect ratio as high as 4.4 for 80 nm nanopillars. For the patterning method, we used capillary force lithography (CFL) involving direct placement of a polyurethane acrylate mold onto a spin-coated polymer film followed by raising the temperature above the glass transition temperature of the polymer (T). For the patterning materials, thermoplastic resins such as polystyrene (PS) and poly(methyl methacrylate) (PMMA) and a zinc oxide (ZnO) precursor were used. For the polymer, micro/nanoscale hierarchical structures were fabricated by using sequential application of the same method, which is potentially useful for mimicking functional surfaces such as lotus leafclose6