Broadband dielectric microwave microscopy on μ\mum length scales

We demonstrate that a near-field microwave microscope based on a transmission line resonator allows imaging in a substantially wide range of frequencies, so that the microscope properties approach those of a spatially-resolved impedance analyzer. In the case of an electric probe, the broadband imaging can be used in a direct fashion to separate contributions from capacitive and resistive properties of a sample at length scales on the order of one micron. Using a microwave near-field microscope based on a transmission line resonator we imaged the local dielectric properties of a Focused Ion Beam (FIB) milled structure on a high-dielectric-constant Ba_{0.6}Sr_{0.4}TiO_3 (BSTO) thin film in the frequency range from 1.3 GHz to 17.4 GHz. The electrostatic approximation breaks down already at frequencies above ~10 GHz for the probe geometry used, and a full-wave analysis is necessary to obtain qualitative information from the images.Comment: 19 pages (preprint format), 5 figures; to be published in Review of Scientific Instrument

Near-Field Microwave Microscopy on nanometer length scales

The Near-Field Microwave Microscope (NSMM) can be used to measure ohmic losses of metallic thin films. We report on the presence of a new length scale in the probe-to- sample interaction for the NSMM. We observe that this length scale plays an important role when the tip to sample separation is less than about 10nm. Its origin can be modeled as a tiny protrusion at the end of the tip. The protrusion causes deviation from a logarithmic increase of capacitance versus decreasing height of the probe above the sample. We model this protrusion as a cone at the end of a sphere above an infinite plane. By fitting the frequency shift of the resonator versus height data (which is directly related to capacitance versus height) for our experimental setup, we find the protrusion size to be 3nm to 5nm. For one particular tip, the frequency shift of the NSMM relative to 2 micrometers away saturates at a value of about -1150 kHz at a height of 1nm above the sample, where the nominal range of sheet resistance values of the sample are 15 ohms to 150 ohms. Without the protrusion, the frequency shift would have followed the logarithmic dependence and reached a value of about -1500 kHz.Comment: 6 pages, 7 figures (included in 6 pages

Nanometer-Scale Materials Contrast Imaging with a Near-Field Microwave Microscope

We report topography-free materials contrast imaging on a nano-fabricated Boron-doped Silicon sample measured with a Near-field Scanning Microwave Microscope over a broad frequency range. The Boron doping was performed using the Focus Ion Beam technique on a Silicon wafer with nominal resistivity of 61 Ohm.cm. A topography-free doped region varies in sheet resistance from 1000Ohm/Square to about 400kOhm/Square within a lateral distance of 4 micrometer. The qualitative spatial-resolution in sheet resistance imaging contrast is no worse than 100 nm as estimated from the frequency shift signal.Comment: 5 pages, 3 figures, 1 tabl

Optics and Quantum Electronics

Contains reports on nine research projects split into two sections.National Science Foundation (Grant DAR80-08752)National Science Foundation (Grant ECS79-19475)Joint Services Electronics Program (Contract DAAG29-83-K-0003)National Science Foundation (Grant ECS80-20639)National Science Foundation (Grant ECS82-11650

Submicron Structure Fabrication and Research

Contains reports on six research projects.Joint Services Electronics Program (Contract DAAG29-78-C-0020)Joint Services Electronics Program (Contract DAAG29-80-C-0104)M.I.T. Sloan Fund for Basic ResearchU.S. Navy - Office of Naval Research (Contract N00014-79-C-0908)Lawrence Livermore Laboratory (Subcontract 206-92-09)U.S. Department of Energy (Contract DE-ACO2-80-E10179)Harkness Foundatio

Optics and Quantum Electronics

Contains reports on eleven research projects.Joint Services Electronics Program (Contract DAAG29-83-K-0003)National Science Foundation (Grant ECS83-05448)National Science Foundation (Grant ECS83-10718)National Science Foundation (Grant ECS82-11650)National Science Foundation (Grant ECS84-06290)U.S. Air Force - Office of Scientific Research (Contract AFOSR-85-0213)National Institutes of Health (Grant 1 RO1 GM35459

Focused Ion Beam Fabrication

Contains summary of research program and reports on four research projects.Charles Stark Draper Laboratory (Contract DL-H-225270)Hughes Research LaboratoriesInternational Business Machines, Inc. (Contract 456614)Nippon Telegraph and Telephone, Inc.U.S. Navy - Office of Naval Research (Contract N00014-84-K-0073)U.S. Department of Defense (Contract MDA903-85-C-0215)Hitachi Central Research Laborator

Quantum Electronics

Contains reports on eleven research projects.Air Force Rome Air Development Center (in collaboration with C.C. Leiby Jr)U.S. Air Force - Rome Air Development Center (Contract F19628-80-C-0077)National Science Foundation (Grant PHY79-09739)Joint Services Electronics Program (Contract DAAG29-80-C-0104)Air Force Geophysics Laboratory (Contract F 19628-79-C-0082)National Science Foundation (Grant DAR80-08752)National Science Foundation (Grant ECS79-19475)National Science Foundation (Grant ECS80-17705)National Science Foundation (Grant ENG79-09980

Focused Ion Beam Fabrication

Contains reports on five research projects.DARPA/Naval Electronic Systems Command (Contract MDA-903-85-C-0215)Charles Stark Draper Laboratory (Contract DL-H-261827)U.S. Navy - Office of Naval Research (Contract N00014-84-K-0073)Nippon Telephone and TelegraphHitachi Central Research Laborator

Focused Ion Beam Fabrication

Contains reports on four sections of one research project.Microsystems Technology LaboratoriesDefense Advanced Research Projects Agency/Naval Electronics Systems Command (Contract MDA 903-85-C-0215)U.S. Air Force (through Lincoln Laboratory)Defense Advanced Research Projects Agency (through Lincoln Laboratory)Charles Stark Draper Laboratory, Inc. (Contract DL-H-261827)Hitachi Central Research LaboratoryNippon Telegraph & TelephoneU.S. Army Research Office (Contract DAALO3-87-K-0126