The instant effect of embodiment via mirror visual feedback on electroencephalogram-based brain connectivity changes: A pilot study

The therapeutic efficacy of mirror visual feedback (MVF) is attributed to the perception of embodiment. This study intends to investigate the instantaneous effect of embodiment on brain connectivity. Twelve healthy subjects were required to clench and open their non-dominant hands and keep the dominant hands still during two experimental sessions. In the first session, the dominant hand was covered and no MVF was applied, named the sham-MVF condition. Random vibrotactile stimulations were applied to the non-dominant hand with MVF in the subsequent session. Subjects were asked to pedal while having embodiment perception during motor tasks. As suggested by previous findings, trials of no vibration and continuous vibration were selected for this study, named the condition of MVF and vt-MVF. EEG signals were recorded and the alterations in brain connectivity were analyzed. The average node degrees of sham-MVF, MVF, and vt-MVF conditions were largely different in the alpha band (9.94, 11.19, and 17.37, respectively). Further analyses showed the MVF and vt-MVF had more nodes with a significantly large degree, which mainly occurred in the central and the visual stream involved regions. Results of network metrics showed a significant increment of local and global efficiency, and a reduction of characteristic path length for the vt-MVF condition in the alpha and beta bands compared to sham-MVF, and in the alpha band compared to MVF. Similar trends were found for MVF condition in the beta band compared to sham-MVF. Moreover, significant leftward asymmetry of global efficiency and rightward asymmetry of characteristic path length was reported in the vt-MVF condition in the beta band. These results indicated a positive impact of embodiment on network connectivity and neural communication efficiency, which reflected the potential mechanisms of MVF for new insight into neural modulation

(4Z)-4-[(2-Chloro­anilino)(phen­yl)methyl­idene]-3-methyl-1-phenyl-1H-pyrazol-5(4H)-one

The title compound, C23H18ClN3O, exists in an enamine–keto form with the amino group involved in an intra­molecular N—H⋯O hydrogen bond. The five-membered ring is nearly planar, the largest deviation being 0.0004 (7) Å, and makes dihedral angles of 16.62 (6), 41.89 (5) and 71.27 (4)° with the phenyl rings. In the crystal, weak C—H⋯O hydrogen bonds link the mol­ecules into supra­molecular chains along the b axis

Depth-profiling plasma-induced densification of porous low-k thin films using positronium annihilation lifetime spectroscopy

Positronium annihilation lifetime spectroscopy (PALS) has been used to depth profile the densification induced in a porous low-dielectric constant (k) thin film by typical device integration processing, including exposure to plasmas and oxygen ashing. Such “integration damage” has previously been observed as an undesirable increase in k accompanied by shrinkage in the porous film thickness. PALS confirms that the structural damage is confined to a surface layer of collapsed pores with the underlying pores being undamaged. The dense layer thickness determined by PALS increases with plasma exposure time. © 2002 American Institute of Physics.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/70582/2/APPLAB-81-8-1447-1.pd

Probing Cu Diffusion Barrier Layers on Porous Low-Dielectric-Constant Films by Posireonium Annihilation Lifetime Spectroscopy

Two kinds of Cu diffusion barrier layers, sealed films and capped films, on nanoporous low-dielectric-constant films are investigated by positronium annihilation lifetime spectroscopy (PALS). We have found that the minimum thickness of Ta to form an effective diffusion barrier is affected by the pore size. The films with large pores require thick barrier layers to form effective diffusion barriers. In addition, a possible ultra-thin diffusion barrier, i.e. a plasma-induced densification layer, has also been investigated. The PALS data confirm that a porous low-dielectric-constant thin film can be shrunk by exposure to plasma. This shrinkage is confined to a surface layer of collapsed pores and forms a dense layer. The dense layer tends to behave as Ps (positronium) diffusion barriers. Indeed, the controlled thin ``skin'' layer could prevent Cu diffusion into the underlying dielectrics.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/49235/2/w51150.pd

Nanoporous Structure in Low-Dielectric Films with Positronium Annihilation Lifetime Spectroscopy

We investigate nano-porous structures in thin low-dielectric films, i.e. the pore sizes, distributions, and interconnectivity, by using depth profiled positronium annihilation lifetime spectroscopy (PALS). It is found that PALS has good sensitivity to probe both interconnected and closed pores in the range from 0.3 nm to 30 nm, even in the film buried beneath a diffusion barrier. A series of low dielectric constant films of organosilicon-silsequioxane with different weight percentages of porogen have been comparatively investigated. The PALS technique can be used to distinguish the open porosity from the closed one, to determine the pore size, and to detect the percolation threshold with the increasing porosity that represents the transition from closed pores to interconnected pores. Furthermore, the pore percolation length can be derived.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/49236/2/w50653.pd