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1 research outputs found
Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair
Author
A Botman
A Botman
+43Â more
A Botman
B Geier
B. B. Lewis
BL Henke
C Elbadawi
C Hopf
CH Schwalb
F Porrati
F Porrati
H Plank
H Plank
H Plank
H Plank
H. Plank
I Utke
J Bishop
J. D. Fowlkes
J. H. Noh
JD Wnuk
JJL Mulders
JM Slaughter
JTW Barbee
M Takeguchi
M. G. Stanford
MG Lassiter
MH Ervin
NA Roberts
NA Roberts
P. D. Rack
PD Rack
R Cordoba
RM Langford
RM Langford
RS Rosen
S Frabboni
S Mehendale
S Wang
SJ Randolph
SP Vernon
T Bret
T Liang
V Gopal
V Scheuer
Publication venue
'Springer Science and Business Media LLC'
Publication date
Field of study
No full text
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