NSOM Lithography for Organized Growth of Gap Nanowires

In this contribution, near field scanning optical microscope (NSOM) lithography is presented as a tool for organized growth of nanowires. Non contact mode of NSOM lithography was used to pattern planar structures in photoresist deposited on GaP substrate. In combination with lift-off technique, metal-catalyst particles on GaP substrate for subsequent growth of GaP nanowires were prepared. Different periodic and predefined arrangements of GaP nanowires were achieved