Morphology of epitaxial core-shell nanowires

We analyze the morphological stability against azimuthal, axial, and general helical perturbations for epitaxial core-shell nanowires in the growth regimes limited by either surface diffusion or evaporation-condensation surface kinetics. For both regimes, we find that geometric parameters (i.e., core radius and shell thickness) play a central role in determining whether the nanowire remains cylindrical or its shell breaks up into epitaxial islands similar to those observed during Stranski-Krastanow growth in thin epilayers. The combination of small cores and rapid growth of the shell emerge as key ingredients for stable shell growth. Our results provide an explanation for the different core-shell morphologies reported in the Si-Ge system experimentally, and also identify a growth-induced intrinsic mechanism for the formation of helical nanowires.Comment: In press, Nano Letters (7 pages, 4 figures

Disclinations, dislocations and continuous defects: a reappraisal

Disclinations, first observed in mesomorphic phases, are relevant to a number of ill-ordered condensed matter media, with continuous symmetries or frustrated order. They also appear in polycrystals at the edges of grain boundaries. They are of limited interest in solid single crystals, where, owing to their large elastic stresses, they mostly appear in close pairs of opposite signs. The relaxation mechanisms associated with a disclination in its creation, motion, change of shape, involve an interplay with continuous or quantized dislocations and/or continuous disclinations. These are attached to the disclinations or are akin to Nye's dislocation densities, well suited here. The notion of 'extended Volterra process' takes these relaxation processes into account and covers different situations where this interplay takes place. These concepts are illustrated by applications in amorphous solids, mesomorphic phases and frustrated media in their curved habit space. The powerful topological theory of line defects only considers defects stable against relaxation processes compatible with the structure considered. It can be seen as a simplified case of the approach considered here, well suited for media of high plasticity or/and complex structures. Topological stability cannot guarantee energetic stability and sometimes cannot distinguish finer details of structure of defects.Comment: 72 pages, 36 figure