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    ΠœΠΎΠ΄Π΅Π»ΠΈΡ€ΠΎΠ²Π°Π½ΠΈΠ΅ ΠΈ оптимизация Ρ„ΡƒΠ½ΠΊΡ†ΠΈΠΈ качСства тСхнологичСских процСссов формирования Ρ„ΡƒΠ½ΠΊΡ†ΠΈΠΎΠ½Π°Π»ΡŒΠ½Ρ‹Ρ… ΠΏΠΎΠΊΡ€Ρ‹Ρ‚ΠΈΠΉ ΠΈ ΠΏΠ»Π΅Π½ΠΎΠΊ

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    The modeling of processes of formation of thin films in magnetron sputtering systems in the substrate potential field at different ratios of relations between the sprayed material and the substrate for various types of structures of the substrate is considered. Growth models of thin films point emitters integration method with the use of Monte-Carlo algorithms with accounting of the annealing are used. The comparison of results of computer simulation and experiment is executed; the inverse problem to optimization process using the quality function that takes into account the uniformity of the synthesized thin films, the flow of materials and the geometry of the spray is solved.РассмотрСно ΠΌΠΎΠ΄Π΅Π»ΠΈΡ€ΠΎΠ²Π°Π½ΠΈΠ΅ процСссов формирования Ρ‚ΠΎΠ½ΠΊΠΈΡ… ΠΏΠ»Π΅Π½ΠΎΠΊ Π² установках ΠΌΠ°Π³Π½Π΅Ρ‚Ρ€ΠΎΠ½Π½ΠΎΠ³ΠΎ распылСния. ΠœΠΎΠ΄Π΅Π»ΠΈΡ€ΠΎΠ²Π°Π½ΠΈΠ΅ основано Π½Π° вСроятностном ΠΏΠΎΠ΄Ρ…ΠΎΠ΄Π΅ ΠΈ ΠΈΠ½Ρ‚Π΅Π³Ρ€Π°Ρ†ΠΈΠΈ Ρ‚ΠΎΡ‡Π΅Ρ‡Π½Ρ‹Ρ… испаритСлСй. ΠŸΡ€ΠΈ ΠΌΠΎΠ΄Π΅Π»ΠΈΡ€ΠΎΠ²Π°Π½ΠΈΠΈ ΡƒΡ‡ΠΈΡ‚Ρ‹Π²Π°Π»ΠΈΡΡŒ ΠΎΡ‚Π½ΠΎΡΠΈΡ‚Π΅Π»ΡŒΠ½ΠΎΠ΅ распрСдСлСниС Ρ‚ΠΎΠ»Ρ‰ΠΈΠ½Ρ‹ Ρ‚ΠΎΠ½ΠΊΠΈΡ… ΠΏΠ»Π΅Π½ΠΎΠΊ ΠΈ ΡΡ„Ρ„Π΅ΠΊΡ‚ΠΈΠ²Π½ΠΎΡΡ‚ΡŒ массопСрСноса частиц. Π’Ρ‹ΠΏΠΎΠ»Π½Π΅Π½ΠΎ сравнСниС Ρ€Π΅Π·ΡƒΠ»ΡŒΡ‚Π°Ρ‚ΠΎΠ² ΠΊΠΎΠΌΠΏΡŒΡŽΡ‚Π΅Ρ€Π½ΠΎΠ³ΠΎ модСлирования ΠΈ экспСримСнта; Ρ€Π΅ΡˆΠ΅Π½Π° обратная Π·Π°Π΄Π°Ρ‡Π° ΠΎΠΏΡ‚ΠΈΠΌΠΈΠ·Π°Ρ†ΠΈΠΈ процСсса с использованиСм Π²Π²Π΅Π΄Π΅Π½Π½ΠΎΠΉ Ρ„ΡƒΠ½ΠΊΡ†ΠΈΠΈ качСства, ΡƒΡ‡ΠΈΡ‚Ρ‹Π²Π°ΡŽΡ‰Π΅ΠΉ Ρ€Π°Π²Π½ΠΎΠΌΠ΅Ρ€Π½ΠΎΡΡ‚ΡŒ синтСзируСмых Ρ‚ΠΎΠ½ΠΊΠΈΡ… ΠΏΠ»Π΅Π½ΠΎΠΊ, расход ΠΌΠ°Ρ‚Π΅Ρ€ΠΈΠ°Π»ΠΎΠ² ΠΈ Π³Π΅ΠΎΠΌΠ΅Ρ‚Ρ€ΠΈΡŽ области распылСния

    The simulation and the optimization of the quality function of the process of the nanoscale film’s growth

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    The modeling of processes of formation of thin films in magnetron sputtering systems in the substrate potential field at different ratios of relations between the sprayed material and the substrate for various types of structures of the substrate is considered. Growth models of thin films point emitters integration method with the use of Monte-Carlo algorithms with accounting of the annealing are used. The comparison of results of computer simulation and experiment is executed; the inverse problem to optimization process using the quality function that takes into account the uniformity of the synthesized thin films, the flow of materials and the geometry of the spray is solved
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