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    Π‘Ρ‚Π°Π½Π΄Π°Ρ€Ρ‚Π½Ρ‹Π΅ ΠΎΠ±Ρ€Π°Π·Ρ†Ρ‹ Π²Ρ€Π΅ΠΌΠ΅Π½ΠΈ ΠΆΠΈΠ·Π½ΠΈ нСравновСсных носитСлСй заряда Π² монокристалличСском ΠΊΡ€Π΅ΠΌΠ½ΠΈΠΈ

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    A comparison of two methods for measurement of the free carrier recombination lifetime in the unpassivated samples of high resistivity n-type silicon single crystalls (reference samples of "GIREDMET") was made. The methods were based on the photoconductivity decay measurements (High frequence and /-PCD). Effective recombination lifetime value in the range 1-1500 /is were achieved by changes of the sample thickness from 0,4 to 10 mm. Bulk recombination lifetime was calculated using the relation between the effective recombination lifetime and the sample thickness. It was shown that random and systematic errors for two methods are of the same order.ΠŸΡ€ΠΎΠ²Π΅Π΄Π΅Π½ΠΎ сравнСниС Ρ€Π΅Π·ΡƒΠ»ΡŒΡ‚Π°Ρ‚ΠΎΠ² измСрСния эффСктивного Π²Ρ€Π΅ΠΌΠ΅Π½ΠΈ ΠΆΠΈΠ·Π½ΠΈ нСравновСсных носитСлСй заряда Π½Π° нСпассивированных пластинах высокоомного монокристалличСского крСмния Π² ΠΈΠ½Ρ‚Π΅Ρ€Π²Π°Π»Π΅ эффСктивного Π²Ρ€Π΅ΠΌΠ΅Π½ΠΈ ΠΆΠΈΠ·Π½ΠΈ 10-1500 мкс ΠΈ Ρ‚ΠΎΠ»Ρ‰ΠΈΠ½Ρ‹ 0,4-10 ΠΌΠΌ (БОП Β«Π“Π˜Π Π•Π”ΠœΠ•Π’Β») бСсконтактными Π’Π§- ΠΈ Π‘Π’Π§-ΠΌΠ΅Ρ‚ΠΎ-Π΄Π°ΠΌΠΈ. ΠŸΡ€ΠΎΠ²Π΅Π΄Π΅Π½Ρ‹ ΠΎΡ†Π΅Π½ΠΊΠΈ Π²Ρ€Π΅ΠΌΠ΅Π½ΠΈ ΠΆΠΈΠ·Π½ΠΈ Π² объСмС ΠΌΠ°Ρ‚Π΅Ρ€ΠΈΠ°Π»Π° ΠΏΠΎ зависимости ΠΎΠ±Ρ€Π°Ρ‚Π½ΠΎΠ³ΠΎ эффСктивного Π²Ρ€Π΅ΠΌΠ΅Π½ΠΈ ΠΆΠΈΠ·Π½ΠΈ ΠΎΡ‚ ΠΊΠ²Π°Π΄Ρ€Π°Ρ‚Π° ΠΎΠ±Ρ€Π°Ρ‚Π½ΠΎΠΉ Ρ‚ΠΎΠ»Ρ‰ΠΈΠ½Ρ‹ Π² ΠΈΠ½Ρ‚Π΅Ρ€Π²Π°Π»Π΅ Ρ‚ΠΎΠ»Ρ‰ΠΈΠ½Ρ‹ 1-4 ΠΌΠΌ. Показано, Ρ‡Ρ‚ΠΎ привСдСнная Π² паспортС БОП ΠΏΠΎΠ³Ρ€Π΅ΡˆΠ½ΠΎΡΡ‚ΡŒ Ρ€Π΅Π·ΡƒΠ»ΡŒΡ‚Π°Ρ‚ΠΎΠ² измСрСния Π’Π§-ΠΌΠ΅Ρ‚ΠΎΠ΄ΠΎΠΌ Π² 10 % Ρ…Π°Ρ€Π°ΠΊΡ‚Π΅Ρ€ΠΈΠ·ΡƒΠ΅Ρ‚ ΡΠ»ΡƒΡ‡Π°ΠΉΠ½ΡƒΡŽ ΠΏΠΎΠ³Ρ€Π΅ΡˆΠ½ΠΎΡΡ‚ΡŒ измСрСния, Π²Π΅Π»ΠΈΡ‡ΠΈΠ½Π° ΠΊΠΎΡ‚ΠΎΡ€ΠΎΠΉ ΠΎΠ΄Π½ΠΎΠ³ΠΎ порядка со случайной ΠΏΠΎΠ³Ρ€Π΅ΡˆΠ½ΠΎΡΡ‚ΡŒΡŽ измСрСния Π‘Π’Π§-ΠΌΠ΅Ρ‚ΠΎΠ΄ΠΎΠΌ Π½Π° установкС с ΠΊΠΎΠ»ΡŒΡ†Π΅Π²Ρ‹ΠΌ Π·Π°Π·ΠΎΡ€ΠΎΠΌ. Показано, Ρ‡Ρ‚ΠΎ Π’Π§- ΠΈ Π‘Π’Π§-ΠΌΠ΅Ρ‚ΠΎΠ΄Ρ‹ ΠΈΠΌΠ΅ΡŽΡ‚ ΡΠΈΡΡ‚Π΅ΠΌΠ°Ρ‚ΠΈΡ‡Π΅ΡΠΊΡƒΡŽ ΠΏΠΎΠ³Ρ€Π΅ΡˆΠ½ΠΎΡΡ‚ΡŒ ΠΎΠ΄Π½ΠΎΠ³ΠΎ порядка

    Reference samples of the silicon single crystalls free carrier recombination lifetime

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    A comparison of two methods for measurement of the free carrier recombination lifetime in the unpassivated samples of high resistivity n-type silicon single crystalls (reference samples of "GIREDMET") was made. The methods were based on the photoconductivity decay measurements (High frequence and /-PCD). Effective recombination lifetime value in the range 1-1500 /is were achieved by changes of the sample thickness from 0,4 to 10 mm. Bulk recombination lifetime was calculated using the relation between the effective recombination lifetime and the sample thickness. It was shown that random and systematic errors for two methods are of the same order
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