Cu Electroless Deposition onto Ta substrates-Application to Create a Seed Layer for Cu Electrodeposition

Copper electroless deposition ELD was investigated for applications that create a seed layer for Cu electrodeposition. On Pd catalysts formed on the Ta substrates through Sn sensitization–Pd activation, continuous Cu seed layer of 40 nm was electrolessly deposited in a diluted electrolyte. Dilution of the electrolyte enabled the film to make a thin and conformal layer without oxygen incorporation, by which the ELD Cu seed had properties comparable to the physical vapor deposited seed layer regarding surface roughness and resistivity, even after subsequent Cu electrodeposition, and had superior step coverage. Defect-free bottom-up filling by electrodeposition was achieved on these ELD seed layers.This work was supported by KOSEF through the Research Center for Energy Conversion and Storage RCECS , Dongbu Electronics Co. Ltd., and by the Institute of Chemical Processes ICP

Leveling of Superfilled Damascene Cu Film Using Two-Step Electrodeposition

To enhance the compatibility of electrodeposition with the chemical mechanical polishing process, we attempted to prevent step formation on active areas. In the absence of benzotriazole BTA , the step heights increased with the decrease in the pattern width and the increase in the pattern density due to the locally condensed accelerator. However, the addition of BTA significantly suppressed the deposition kinetic through the deactivation of the accelerator. The two-step electrodeposition with modulated accelerator and BTA concentrations was found to be effective in the retardation of bump formation and the prevention of bumps from growing without an impact on the superfilling

On finite time blow-up for the mass-critical Hartree equations

We consider the fractional Schrodinger equations with focusing Hartree-type nonlinearities. When the energy is negative, we show that the solution blows up in a finite time. For this purpose, based on Glassey's argument, we obtain a virial-type inequality

Well-posedness and ill-posedness for the cubic fractional Schrödinger equations

We study the low regularity well-posedness of the 1-dimensional cubic nonlinear fractional Schrödinger equations with Lévy indices 1 < ?? < 2. We consider both non-periodic and periodic cases, and prove that the Cauchy problems are locally well-posed in Hs for s ??? 2-??/4. This is shown via a trilinear estimate in Bourgain's Xs,b space. We also show that non-periodic equations are ill-posed in Hs for 2-3??/4(??+1) < s < 2-??/ 4 in the sense that the flow map is not locally uniformly continuous.close0