Stitching interferometry for ellipsoidal x-ray mirrors

Ellipsoidal mirrors, which can efficiently produce a two-dimensional focusing beam with a single mirror, are superior x-ray focusing optics, especially when compared to elliptical-cylinder mirrors in the Kirkpatrick-Baez geometry. However, nano-focusing ellipsoidal mirrors are not commonly used for x-ray optics because achieving the accuracy required for the surface metrology of nano-focusing ellipsoidal mirrors is difficult due to their small radius of curvature along the short ellipsoidal axis. Here, we developed a surface metrology system for nano-focusing ellipsoidal mirrors using stitching interferometric techniques. The developed system simultaneously measures sub-aperture shapes with a microscopic interferometer and the tilt angles of the sub-aperture shapes with a large Fizeau interferometer. After correcting the systematic errors included in the sub-aperture shapes, the entire mirror shape is calculated by stitching the sub-aperture shapes based on the obtained relative angles between partially overlapped sub-apertures. In this study, we developed correction methods for systematic errors in sub-aperture shapes that originated from off-axis aberrations produced in the optics of the microscopic interferometer. The systematic errors on an ellipsoidal mirror were estimated by measuring a series of tilted plane substrates and the ellipsoidal substrate. From measurements of an ellipsoidal mirror with a 3.6-mm radius of curvature at the mirror center, we obtained a measurement repeatability of 0.51 nm (root-mean-square) in an assessment area of 0.5 mm × 99.18 mm. This value satisfies the requirements for surface metrology of nano-focusing x-ray mirrors. Thus, the developed metrology system should be applicable for fabricating nano-focusing ellipsoidal mirrors.Hirokatsu Yumoto, Takahisa Koyama, Satoshi Matsuyama, Kazuto Yamauchi, and Haruhiko Ohashi, "Stitching interferometry for ellipsoidal x-ray mirrors", Review of Scientific Instruments 87, 051905 (2016) https://doi.org/10.1063/1.4950714

Single-Shot Spectrometry for X-Ray Free-Electron Lasers

An experimental scheme to realize single-shot spectrometry for the diagnostics of x-ray free-electron lasers (XFELs) is presented. The combination of an ultraprecisely figured mirror and a perfect crystal form a simple, high-precision spectrometer that can cover an energy range from a few eV to a hundred eV with high resolution. The application of the spectrometer to determine XFEL pulse widths was investigated theoretically and experimentally. It has been shown that the present system can determine pulse widths from sub-fs to ps in a single shot even for spontaneous radiation. The system can be easily extended to even shorter pulses.Makina Yabashi, Jerome B. Hastings, Max S. Zolotorev, Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Kazuto Yamauchi, and Tetsuya Ishikawa. Phys. Rev. Lett. 97(8), 084802 (2006)

Damage characteristics of platinum/carbon multilayers under X-ray free-electron laser irradiation

Jangwoo Kim, Takahisa Koyama, Hirokatsu Yumoto, Ayaka Nagahira, Satoshi Matsuyama, Yasuhisa Sano, Makina Yabashi, Haruhiko Ohashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Damage characteristics of platinum/carbon multilayers under x-ray free-electron laser irradiation", Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480S (27 September 2013); https://doi.org/10.1117/12.2022735

At-wavelength figure metrology of hard x-ray focusing mirrors

We have developed an at-wavelength wave-front metrology of a grazing-incidence focusing optical systems in the hard x-ray region. The metrology is based on numerical retrieval from the intensity profile around the focal point. We demonstrated the at-wavelength metrology and estimated the surface figure error on a test mirror. An experiment for measuring the focusing intensity profile was performed at the 1-km-long beamline (BL29XUL) of SPring-8. The obtained results were compared with the profile measured using an optical interferometer and were confirmed to be in good agreement with it. This technique is a potential method of characterizing wave-front aberrations on elliptical mirrors for sub-10-nm focusing. © 2006 American Institute of Physics.Yumoto H., Mimura H., Matsuyama S., et al. At-wavelength figure metrology of hard x-ray focusing mirrors. Review of Scientific Instruments, 77, 6, 063712 (2006) https://doi.org/10.1063/1.221687

Measurement of the X-ray spectrum of a free electron laser with a wide-range high-resolution single-shot spectrometer

We developed a single-shot X-ray spectrometer for wide-range high-resolution measurements of Self-Amplified Spontaneous Emission (SASE) X-ray Free Electron Laser (XFEL) pulses. The spectrometer consists of a multi-layer elliptical mirror for producing a large divergence of 22 mrad around 9070 eV and a silicon (553) analyzer crystal. We achieved a wide energy range of 55 eV with a fine spectral resolution of 80 meV, which enabled the observation of a whole SASE-XFEL spectrum with fully-resolved spike structures. We found that a SASE-XFEL pulse has around 60 longitudinal modes with a pulse duration of 7.7 ± 1.1 fs.Inubushi, Y.; Inoue, I.; Kim, J.; Nishihara, A.; Matsuyama, S.; Yumoto, H.; Koyama, T.; Tono, K.; Ohashi, H.; Yamauchi, K.; Yabashi, M. Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer. Appl. Sci. 2017, 7, 584. https://doi.org/10.3390/app7060584

Direct determination of the wave field of an x-ray nanobeam

We present a remarkably accurate method for determining the wave field of an x-ray nanobeam. The intensity profile of a beam was directly measured over a range of three orders of magnitude while its phase distribution was successfully recovered using an iterative algorithm. The evolution of the wave field along the beam propagation direction was precisely simulated, and there was good agreement with the experimental results.Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi Phys. Rev. A 77, 015812 (2008)

Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km -long beamline of SPring-8. © 2007 American Institute of Physics.Hidekazu Mimura, Hirokatsu Yumoto, et al. "Efficient focusing of hard x rays to 25nm by a total reflection mirror", Appl. Phys. Lett. 90(5), 051903 (2007) https://doi.org/10.1063/1.2436469

Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation

X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μ4m focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO2), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.Takahisa Koyama, Hirokatsu Yumoto, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, and Haruhiko Ohashi "Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation", Proc. SPIE 9511, Damage to VUV, EUV, and X-ray Optics V, 951107 (12 May 2015); https://doi.org/10.1117/12.218277

At-wavelength figure metrology of total reflection mirrors in hard x-ray region

Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi "At-wavelength figure metrology of total reflection mirrors in hard x-ray region", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631709 (29 August 2006); https://doi.org/10.1117/12.681587