Defining the industrial and engineering management professional profile: a longitudinal study based on job advertisements

The engineering professional profiles have been discussed by several branches of the engineering field. On the one hand, this discussion helps to understand the professional practice and contributes to the specification of the competences that are suitable for each function and company culture. On the other hand, it is an essential starting point for the definition of curricula in engineering schools. Thus, this study aims to characterize, in an innovative way based on job advertisements, the demand for competences and areas of practice for Industrial Engineering and Management contributing for the definition of a professional profile. This characterization is based on the analysis of 1391 job advertisements, collected during seven years from a Portuguese newspaper. The data analysis takes into account the job description in which two categories were considered: areas of professional practice (e.g. project management) and transversal competences (e.g. teamwork). Considering the total number of job advertisements, it was possible to identify 1,962 cumulative references for 11 professional practice areas and 5,261 cumulative references for transversal competences. The contribution of this study lies on the identification of the main areas of practice and the main transversal competences demanded by employers.This work was partially funded by COMPETE-POCI-01-0145-FEDER-007043 and FCT-UID-CEC-00319-2013

Damage studies of multilayer optics for XUV free electron lasers

We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given

Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers. They can fulfill the extreme requirements in terms of figure and roughness errors, wavefront preservation, and stability. Such optics enable deflection angles much larger than those reasonably achieved with single material mirrors. In addition, due to their good wavelength selectivity, they can be used as narrow bandpass filters. However, since damage of the optical surface is a possible limitation, resistivity studies of MoSi multilayers were carried out at the XUV Free Electron Laser FLASH in Hamburg. The results, reported in [1], show that the leading damage mechanism is melting of the amorphous silicon layer, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. These studies have been extended to the soft X-ray part of the spectrum at the LCLS FEL facility. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent. A possible explanation will be discussed during the presentation. The results are important for the design and further development of the optical coatings for the new generation of the short wavelength light sources, not only for the multilayers but for the single metallic layer coatings as well