Advances in 2D Material Transfer Systems for van der Waals Heterostructure Assembly

The assembly of van der Waals (vdW) heterostructures using 2D material transfer systems has revolutionized the field of materials science, enabling the development of novel electronic and optoelectronic devices and the probing of emergent phenomena. The innovative vertical stacking methods enabled by these 2D material transfer systems are central to constructing complex devices, which are often challenging to achieve with traditional bottom-up nanofabrication techniques. Over the past decade, vdW heterostructures have unlocked numerous applications leading to the development of advanced devices, such as transistors, photodetectors, solar cells, and sensors. However, achieving consistent performance remains challenging due to variations in transfer processes, contamination, and the handling of air-sensitive materials, among other factors. Several of these challenges can be addressed through careful design considerations of transfer systems and through innovative modifications. This mini-review critically examines the current state of transfer systems, focusing on their design, cost-effectiveness, and operational efficiency. Special emphasis is placed on low-cost systems and glovebox integration essential for handling air-sensitive materials. We highlight recent advancements in transfer systems, including the integration of cleanroom environments within gloveboxes and the advent of robotic automation. Finally, we discuss ongoing challenges and the necessity for further innovations to achieve reliable, cleaner, and scalable vdW technologies for future applications

CVD Synthesis of Intermediate State-Free, Large-Area and Continuous MoS2 via Single-Step Vapor-Phase Sulfurization of MoO2 Precursor

The low evaporation temperature and carcinogen classification of commonly used molybdenum trioxide (MoO3) precursor render it unsuitable for the safe and practical synthesis of molybdenum disulfide (MoS2). Furthermore, as evidenced by several experimental findings, the associated reaction constitutes a multistep process prone to the formation of uncontrolled amounts of intermediate MoS2−yOy phase mixed with the MoS2 crystals. Here, molybdenum dioxide (MoO2), a chemically more stable and safer oxide than MoO3, was utilized to successfully grow cm-scale continuous films of monolayer MoS2. A high-resolution optical image stitching approach and Raman line mapping were used to confirm the composition and homogeneity of the material grown across the substrate. A detailed examination of the surface morphology of the continuous film revealed that, as the gas flow rate increased by an order of magnitude, the grain-boundary separation dramatically reduced, implying a transition from a kinetically to thermodynamically controlled growth. Importantly, the single-step vapor-phase sulfurization (VPS) reaction of MoO2 was shown to suppress intermediate state formations for a wide range of experimental parameters investigated and is completely absent, provided that the global S:Mo loading ratio is set higher than the stoichiometric ratio of 3:1 required by the VPS reaction