DNA methylation-based classification of sinonasal tumors

The diagnosis of sinonasal tumors is challenging due to a heterogeneous spectrum of various differential diagnoses as well as poorly defined, disputed entities such as sinonasal undifferentiated carcinomas (SNUCs). In this study, we apply a machine learning algorithm based on DNA methylation patterns to classify sinonasal tumors with clinical-grade reliability. We further show that sinonasal tumors with SNUC morphology are not as undifferentiated as their current terminology suggests but rather reassigned to four distinct molecular classes defined by epigenetic, mutational and proteomic profiles. This includes two classes with neuroendocrine differentiation, characterized by IDH2 or SMARCA4/ARID1A mutations with an overall favorable clinical course, one class composed of highly aggressive SMARCB1-deficient carcinomas and another class with tumors that represent potentially previously misclassified adenoid cystic carcinomas. Our findings can aid in improving the diagnostic classification of sinonasal tumors and could help to change the current perception of SNUCs

Precision optical coatings on large substrates by reactive magnetron sputtering

The upscaling of highly productive coating technologies for precison optics and appropriate equipment will be presented. The application for e.g. gradient coatings or special coatings for holographic 3D-displays will be shown

Investigation of ScAlN for piezoelectric and ferroelectric applications

SCXAL1-XN is a promising material to expand the application range of nitride materials, since scandium increases the piezoelectric constants while retaining the crystalline wurtzite structure. In this work, stationary reactive pulse magnetron sputtering is usedfor the deposition offunctional layers with a scandium contentx =0…0.44.Layer morphology, piezoelectric properties and breakdown voltage are studied XRD measurements reveal that high scandium content yields to a weak wurzite formation. The lattice constant dependent on the parameter x is calculated on the base ofXRD data and the curve characteristic agrees with the density functional theory. The highestpiezoelectric coefficient d33 was observed at a scandium content of36.6 %, it amounts to 27.5 pC/N.Parallel capacitor structures are generated by means of chlorine-basedICP etching and lift-offstructuring of the top electrodes. Technological details of the structuring process are presented The etch rate depends strongly on the scandium content. Thepermittivity was determined on the base of these test structures. It increases significantly with increasing scandium content. High capacitance values up to 7.4 nF were measured The adequate breakdown voltage of51 Vfor scandium concentrations of x=0.22 or higher suggest a use ofsuch layers for integrated thin film capacitors in addition to well-triedpiezoelectric applications

High rate reactive sputter deposition of TiO2 films for photocatalyst and dye-sensitized solar cells

We fabricated dye-sensitized solar cells (DSCs) using TiO2 films deposited on various substrates by reactive magnetron sputtering with midfrequency pulsing and process control units, and evaluated their performance. Two pulse modes, i.e., unipolar pulse and pulse packet modes, were utilized to deposit TiO2. The highest conversion efficiency achieved was 3.7% when 10-mu m-thick TiO2 films were deposited on glass substrates coated with fluorine-doped tin oxide (FTO) using the unipolar pulse mode in the oxide mode and postannealing in air. On the other hand, the conversion efficiency achieved was 2.7% for cells with 10-mu m-thick TiO2 films deposited on glass substrates coated with FTO using the pulse packet mode without postannealing, and it dropped to 1.3% when the unipolar pulse mode was used. The relationships between the photocatalytic decomposition activity and the DSC characteristics with regard to the TiO2 films were investigated in detail. The reduction in the density of defects in the TiO2 films led to an improvement in both the photocatalytic activity and the DSC characteristics

Untersuchung von ScAlN für piezoelektrische und ferroelektrische Anwendungen

ScxAl1-xN ist ein vielversprechendes Material, da Scandium unter Beibehaltung der kristallinen Wurtzitstruktur die piezoelektrischen Konstanten gegenüber reinem AlN stark erhöht. In dieser Arbeit wird ein stationäres reaktives Puls-Magnetron-Sputtern zur Abscheidung von Funktionsschichten mit einem Scandiumgehalt x = 0… 0,44 eingesetzt. Die Schichtmorphologie, die piezoelektrische Eigenschaften als auch die Durchbruchspannung werden untersucht. XRD Messungenzeigen, dass ein hoher Scandiumgehalt zu einer schwächer ausgeprägten Wurtzitbildung führt. Die vom Parameterx abhängige Gitterkonstante wurde auf der Basis von XRD-Daten berechnet. Die resultierende Kurvencharakteristik stimmt mit der Dichtefunktionaltheorie überein. Der höchste piezoelektrische Koeffizient d33 wurde bei einem Scandiumgehalt von 36,6% beobachtet, er beträgt 27,5 pC / N. Parallele Kondensatorstrukturen wurden durch chlorbasiertes ICP-Ätzen und Lift-Off-Strukturierung der oberen Elektroden erzeugt. Die technologischen Details des Strukturierungsprozesses werden vorgestellt. Die Ätzrate von ScxAl1-xN hängt dabei stark vom Scandiumgehalt ab. Anhand der Teststrukturen wurde die Permittivität bestimmt. Sie nimmt mit zunehmendem Scandiumgehalt signifikant zu. Es wurden hohe Kapazitätswerte bis zu 7,4 nF gemessen. Die adäquate Durchbruchspannung von 51 V für Scandiumkonzentrationen von x = 0,22 oder höher legt nahe, dass solche Schichten neben den bewährten piezoelektrischen Anwendungen für integrierteDünnschichtkondensatoren verwendet werden können

Large area precision coatings by pulse magnetron sputtering

Pulse magnetron sputtering is very well suited for the deposition of optical coatings. Due to energetic activation during film growth, sputtered films are dense, smooth and show an excellent environmental stability. Films of materials likeSiO2, Al2O3, Nb2O5 or Ta2O5 can be produced with very little absorption and scattering losses and are well suited for precision optics. FEP's coating plant PreSensLine, a deposition machine dedicated for the development and deposition of precision optical layer systems will be presented. The coating machine (VON ARDENNE) is equipped with dual magnetron systems (typeRM by FEP). Concepts regarding machine design, process technology and process control as well as in situ monitoring are presented to realize the high demands on uniformity, accuracy and reproducibility. Results of gradient and multilayer type precision optical coatings are presented. Application examples are edge filters and special antireflective coatings for the backlight of 3D displays with substrate size up to 300 x 400mm. The machine allows deposition of rugate type gradient layers by rotating a rotary table with substrates between two sources of the dual magnetron system. By combination of the precision drive (by LSA) for the substrate movement and a special pulse parameter variation during the deposition process (available with the pulse unit UBS-C2 of FEP), it is possible to adjust the deposition rate as a function of the substrate position exactly. The aim of a current development is a technology for the uniform coating of3D-substrates and freeform components as well as laterally graded layers